⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4622479 | 0.74 | TRPA1 (0.32) | — | |
| SCHEMBL10991607 | 0.73 | — | — | |
| SCHEMBL16287532 | 0.72 | — | — | |
| SCHEMBL14109264 | 0.72 | — | — | |
| SCHEMBL17054605 | 0.69 | — | — | |
| SCHEMBL6522154 | 0.69 | — | — | |
| SCHEMBL6519954 | 0.69 | — | — | |
| SCHEMBL6518262 | 0.69 | GBA1 (0.30) | — | |
| SCHEMBL6940705 | 0.67 | — | — | |
| SCHEMBL2119701 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1124 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10295907-B2 | Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-05-21 | — | — | US | claimed |
| US-10065926-B2 | Use of substituted dihydrooxindolylsulfonamides, or the salts thereof, for increasing the stress tolerance of plants | BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) | 2018-09-04 | — | — | US | claimed |
| CN-107849075-A | A kind of phosphoramidate prodrug of nucleoside analog and its application | 四川海思科制药有限公司 | 2018-03-27 | — | — | CN | claimed |
| US-20180020662-A1 | Substituted 1-cycloalkyl-2-oxotetrahydroquinolin-6-ylsulfonamides or salts thereof and use thereof to increase stress tolerance in plants | BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) | 2018-01-25 | — | — | US | claimed |
| CN-107531635-A | Substituted 1-cycloalkyl-2-oxotetrahydroquinolin-6-yl sulfonamides or salts thereof and their use for enhancing stress tolerance in plants | 拜耳作物科学股份公司 | 2018-01-02 | — | — | CN | claimed |
| EP-3051946-B1 | USE OF SUBSTITUTED DIHYDROOXINDOLYLSULFONAMIDES OR THEIR SALTS FOR INCREASING STRESS TOLERANCE IN PLANTS | BAYER CROPSCIENCE AG (DE) | 2017-11-29 | — | — | EP | claimed |
| US-20160237035-A1 | USE OF SUBSTITUTED DIHYDROOXINDOLYLSULFONAMIDES, OR THE SALTS THEREOF, FOR INCREASING THE STRESS TOLERANCE OF PLANTS | BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) | 2016-08-18 | — | — | US | claimed |
| EP-3051946-A1 | USE OF SUBSTITUTED DIHYDRO-OXINDOLYL SULFONAMIDES, OR THE SALTS THEREOF, FOR INCREASING THE STRESS TOLERANCE OF PLANTS | Bayer CropScience Aktiengesellschaft (DE) | 2016-08-10 | — | — | EP | claimed |
| WO-2015049351-A1 | USE OF SUBSTITUTED DIHYDRO-OXINDOLYL SULFONAMIDES, OR THE SALTS THEREOF, FOR INCREASING THE STRESS TOLERANCE OF PLANTS | BAYER CROPSCIENCE AG (DE) | 2015-04-09 | — | — | WO | claimed |
| US-12044968-B2 | Protective film-forming composition having acetal structure and amide structure | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| EP-4401115-A1 | METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE, AND COMPOSITION FOR EXFOLIATION AND DISSOLUTION | Nissan Chemical Corporation (JP) | 2024-07-17 | — | — | EP | disclosed |
| CN-118355328-A | Composition for forming resist underlayer film comprising polymer containing polycyclic aromatic group | 日产化学株式会社 | 2024-07-16 | — | — | CN | disclosed |
| CN-118339515-A | Composition for forming resist underlayer film having hydroxycinnamic acid derivative | 日产化学株式会社 | 2024-07-12 | — | — | CN | disclosed |
| CN-118339251-A | Release agent, adhesive composition, laminate, and method for producing semiconductor substrate | 日产化学株式会社 | 2024-07-12 | — | — | CN | disclosed |
| US-4500343-A | Oxazolyl and thiazolyl amides as herbicides | ELI LILLY AND COMPANY (US) | 1985-02-19 | — | — | US | disclosed |
| EP-0026369-B1 | CARBAMATES, THEIR PREPARATION AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM | BASF Aktiengesellschaft (DE) | 1984-08-08 | — | — | EP | disclosed |
| EP-0107366-A1 | Pyrrolidinone analogs and precursors | ELI LILLY AND COMPANY (US) | 1984-05-02 | — | — | EP | disclosed |
| US-4436549-A | DIALKOXYBENZAMIDE DERIVATIVES | ELI LILLY AND COMPANY (US) | 1984-03-13 | — | — | US | disclosed |
| US-4335138-A | HYPNOTIC, SEDATIVE | BASF AKTIENGESELLSCHAFT (DE) | 1982-06-15 | — | — | US | disclosed |
| EP-0026369-A2 | Carbamates, their preparation and pharmaceutical compositions containing them | BASF Aktiengesellschaft (DE) | 1981-04-08 | — | — | EP | disclosed |