SCHEMBL28375408

SCHEMBL28375408

CCCCOC(=O)Oc1cccc2cc3cc4ccccc4cc3cc12

nearest known ligand 0.54

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 6/20 0.54
▸ L3MBTL1 Q9Y468 3/20 0.43
▸ TSHR P16473 3/20 0.43
▸ TDP1 Q9NUW8 2/20 0.43
▸ KMT2A Q03164 2/20 0.43
▸ LMNA P02545 1/20 0.43
▸ HPGD P15428 1/20 0.43
▸ KLK7 P49862 1/20 0.43
▸ SMN1; SMN2 Q16637 1/20 0.43
▸ CNR1 P21554 1/20 0.41
▸ CNR2 P34972 1/20 0.41
▸ KDM4E B2RXH2 1/20 0.40
▸ MAPT P10636 1/20 0.40
▸ CYP3A4 P08684 2/20 0.40
▸ MAPK1 P28482 2/20 0.40
▸ ALDH1A1 P00352 2/20 0.40
▸ TP53 P04637 1/20 0.39
▸ HSD17B10 Q99714 1/20 0.39
▸ MTNR1A P48039 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28383712 0.99 ELANE (0.55) ELANEL3MBTL1TSHRTDP1KMT2A
SCHEMBL28371720 0.96 ELANE (0.50) ELANEL3MBTL1TSHRKMT2ALMNA
SCHEMBL28371626 0.95 ELANE (0.49) ELANETSHRKMT2ALMNACNR1
SCHEMBL28375509 0.95 ELANE (0.49) ELANETSHRKMT2ALMNACNR1
SCHEMBL28376495 0.95 ELANE (0.49) ELANETSHRKMT2ALMNACNR1
SCHEMBL28382222 0.95 ELANE (0.51) ELANEL3MBTL1TSHRTDP1KMT2A
SCHEMBL31080909 0.95 ELANE (0.59) ELANEL3MBTL1TSHRTDP1KMT2A
SCHEMBL28383707 0.94 ELANE (0.50) ELANETSHRKMT2ALMNACNR1
SCHEMBL28887218 0.94 ELANE (0.50) ELANETSHRKMT2ALMNACNR1
SCHEMBL28387683 0.94 ELANE (0.50) ELANETSHRKMT2ALMNACNR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112394617-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2021-02-23 — — CN disclosed
CN-111796482-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-10-20 — — CN disclosed
CN-110955114-A Photosensitive resin composition, method for producing patterned cured film, and cured film 东京应化工业株式会社 2020-04-03 — — CN disclosed
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