SCHEMBL2838141

SCHEMBL2838141

c1ccc2cc(Cc3ccc4ccccc4c3)ccc2c1

nearest known ligand 0.65

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.65
CYP2A6 P11509 1/20 0.65
ALOX5 P09917 1/20 0.57
HTR2A P28223 1/20 0.54
HTR2C P28335 1/20 0.54
HTR2B P41595 1/20 0.54
CYP2D6 P10635 1/20 0.53
NFKB1 P19838 1/20 0.53
TAAR1 Q96RJ0 1/20 0.53
TEAD4 Q15561 1/20 0.51
CTRC Q99895 1/20 0.50
SIGMAR1 Q99720 1/20 0.50
MC4R P32245 1/20 0.50
MC5R P33032 1/20 0.50
KMT2A Q03164 1/20 0.50
HRH3 Q9Y5N1 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5900962 0.95 CYP1A2 (0.60) CYP1A2CYP2A6ALOX5HTR2AHTR2C
SCHEMBL28846677 0.95 CYP1A2 (0.60) CYP1A2CYP2A6ALOX5HTR2AHTR2C
SCHEMBL598561 0.93 CYP1A2 (0.58) CYP1A2CYP2A6ALOX5HTR2AHTR2C
SCHEMBL29417927 0.93 CYP1A2 (0.58) CYP1A2CYP2A6ALOX5HTR2AHTR2C
Methane SCHEMBL27919163 0.89 CYP1A2 (0.54) CYP1A2CYP2A6ALOX5HTR2AHTR2C
SCHEMBL18482937 0.87 CYP2A6 (0.58) CYP1A2CYP2A6ALOX5HTR2AHTR2C
SCHEMBL29417921 0.87 CYP2A6 (0.58) CYP1A2CYP2A6ALOX5HTR2AHTR2C
SCHEMBL19631126 0.87 CYP2A6 (0.58) CYP1A2CYP2A6ALOX5HTR2AHTR2C
Sulfuric Acid SCHEMBL4093062 0.87 TEAD4 (0.55) CYP1A2CYP2A6ALOX5CYP2D6NFKB1
SCHEMBL10466217 0.87 CYP1A2 (0.58) CYP1A2CYP2A6ALOX5HTR2AHTR2C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4523152-A1 SYSTEMS AND METHODS FOR QUANTUM COMPUTING NVision Imaging Technologies GmbH (DE) 2025-03-19 EP claimed
WO-2023218402-A1 SYSTEMS AND METHODS FOR QUANTUM COMPUTING NVISION IMAGING TECHNOLOGIES GMBH (DE) 2023-11-16 WO claimed
CN-109890866-A Composition epoxy resin and fibre reinforced composites prepared therefrom 东丽株式会社 2019-06-14 CN claimed
EP-4735955-A2 SYSTEMS AND METHODS FOR GENERATING ENTANGLED PHOTONS NVision Imaging Technologies GmbH (DE) 2026-05-06 EP disclosed
US-20250311342-A1 SYSTEMS AND METHODS FOR QUANTUM COMPUTING NVISION IMAGING TECHNOLOGIES GMBH (DE) 2025-10-02 US disclosed
WO-2025125907-A2 SYSTEMS AND METHODS FOR GENERATING ENTANGLED PHOTONS NVISION IMAGING TECHNOLOGIES GMBH (DE) 2025-06-19 WO disclosed
EP-4523152-A1 SYSTEMS AND METHODS FOR QUANTUM COMPUTING NVision Imaging Technologies GmbH (DE) 2025-03-19 EP disclosed
CN-119547084-A System and method for quantum computing 预视成像科技有限责任公司 2025-02-28 CN disclosed
WO-2023218402-A1 SYSTEMS AND METHODS FOR QUANTUM COMPUTING NVISION IMAGING TECHNOLOGIES GMBH (DE) 2023-11-16 WO disclosed
EP-2438989-B1 USE OF ASYMMETRIC HYDROGENATION CATALYST TAKASAGO PERFUMERY CO LTD (JP) 2016-04-13 EP disclosed
US-9061959-B2 Method for manufacturing optically active menthol TAKASAGO INTERNATIONAL CORPORATION (JP) 2015-06-23 US disclosed
US-5461051-A Tetracyclic compounds having anti-allergic and anti-asthmatic activities and their use SANKYO COMPANY, LIMITED (JP) 1995-10-24 US disclosed
US-5362725-A Antiallergens, antiasthmatic SANKYO COMPANY, LIMITED (JP) 1994-11-08 US disclosed
EP-0505014-A2 Novel tetracyclic compounds having anti-allergic and anti-asthmatic activities, their preparation and use Sankyo Company Limited (JP) 1992-09-23 EP disclosed
US-4933355-A ALDOSE REDUCTASE INHIBITORS SANKYO COMPANY LIMITED (JP) 1990-06-12 US disclosed
EP-0337819-A1 Thiazole derivatives, their preparation and their use in the treatment of diabetes complications Sankyo Company Limited (JP) 1989-10-18 EP disclosed
EP-0172427-B1 PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER Shin-Etsu Chemical Co., Ltd. (JP) 1989-07-05 EP disclosed
US-4758639-A Process for production of vinyl polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-19 US disclosed
US-4757124-A Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-12 US disclosed
EP-0172427-A2 Process for production of vinyl chloride polymer Shin-Etsu Chemical Co., Ltd. (JP) 1986-02-26 EP disclosed