SCHEMBL28385668

SCHEMBL28385668

CSC(C)(CC(=O)c1ccccc1)N1CCOCC1

nearest known ligand 0.49

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.49
MAPT P10636 2/20 0.49
KMT2A Q03164 2/20 0.49
SMN1; SMN2 Q16637 3/20 0.47
RAB9A P51151 2/20 0.47
NPC1 O15118 2/20 0.47
TSHR P16473 2/20 0.46
HSD17B10 Q99714 1/20 0.46
MAPK1 P28482 1/20 0.46
HTT P42858 1/20 0.44
ATM Q13315 1/20 0.44
LMNA P02545 1/20 0.42
GAA P10253 1/20 0.41
PHGDH O43175 1/20 0.40
HPGD P15428 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30441322 0.83 ALDH1A1 (0.54) ALDH1A1MAPTKMT2ASMN1; SMN2RAB9A
SCHEMBL29137094 0.77 ALDH1A1 (0.48) ALDH1A1MAPTKMT2ASMN1; SMN2RAB9A
SCHEMBL2223625 0.76 ALDH1A1 (0.56) ALDH1A1MAPTKMT2ASMN1; SMN2RAB9A
SCHEMBL7946131 0.74 ALDH1A1 (0.44) ALDH1A1MAPTKMT2ASMN1; SMN2RAB9A
SCHEMBL52410 0.73 ALDH1A1 (0.68) ALDH1A1MAPTKMT2ASMN1; SMN2NPC1
SCHEMBL10430205 0.73 ALDH1A1 (0.52) ALDH1A1MAPTKMT2ASMN1; SMN2RAB9A
SCHEMBL28207887 0.73 ALDH1A1 (0.52) ALDH1A1MAPTKMT2ASMN1; SMN2RAB9A
SCHEMBL14384783 0.72 CYP1A2 (0.51) ALDH1A1KMT2ASMN1; SMN2RAB9ANPC1
SCHEMBL21798998 0.72 ALDH1A1 (0.45) ALDH1A1MAPTKMT2ASMN1; SMN2RAB9A
SCHEMBL6977284 0.70 ALDH1A1 (0.51) ALDH1A1MAPTKMT2ASMN1; SMN2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117616337-A Film forming material for semiconductor, member forming material for semiconductor, process member forming material for semiconductor, underlayer film forming material, underlayer film, and semiconductor device 株式会社艾迪科 2024-02-27 CN disclosed
CN-116490526-A Compounds and compositions 株式会社艾迪科 2023-07-25 CN disclosed
CN-114127637-A Photosensitive resin composition 株式会社三养社 2022-03-01 CN disclosed
CN-108475019-B Black photosensitive resin composition 株式会社艾迪科 2022-02-11 CN disclosed
CN-107635960-B Oxime ester compound and polymerization initiator containing the same 株式会社艾迪科 2022-02-01 CN disclosed
CN-112424165-A Compound, thiol generator, composition, cured product, and method for producing cured product 株式会社艾迪科 2021-02-26 CN disclosed
CN-111065628-A Novel triazine derivative and photosensitive composition comprising the same 株式会社特雷尔 2020-04-24 CN disclosed