Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRR1 | P24046 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | EPOR | P19235 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8657775 | 0.92 | GABRR1 (0.38) | GABRR1LMNATDP1SMN1; SMN2EPOR | |
| SCHEMBL2450587 | 0.90 | TDP1 (0.39) | GABRR1LMNATDP1SMN1; SMN2EPOR | |
| SCHEMBL8661608 | 0.84 | — | — | |
| SCHEMBL8657479 | 0.82 | — | — | |
| SCHEMBL8659318 | 0.81 | TDP1 (0.31) | TDP1 | |
| SCHEMBL14342937 | 0.80 | GABRR1 (0.36) | GABRR1LMNATDP1SMN1; SMN2 | |
| SCHEMBL14558025 | 0.79 | TDP1 (0.33) | TDP1SMN1; SMN2EPOR | |
| SCHEMBL8950943 | 0.79 | ALOX15 (0.30) | — | |
| SCHEMBL8655918 | 0.78 | — | — | |
| SCHEMBL3425122 | 0.78 | GABRR1 (0.33) | GABRR1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110777381-B | Composition for TiN hardmask removal and etch residue cleaning | 弗萨姆材料美国有限责任公司 | 2022-10-04 | — | — | CN | claimed |
| CN-110777381-A | Composition for TiN hardmask removal and etch residue cleaning | 弗萨姆材料美国有限责任公司 | 2020-02-11 | — | — | CN | claimed |
| CN-110777381-B | Composition for TiN hardmask removal and etch residue cleaning | 弗萨姆材料美国有限责任公司 | 2022-10-04 | — | — | CN | disclosed |
| CN-114761878-A | Etching composition and method for EUV mask protection structure | 弗萨姆材料美国有限责任公司 | 2022-07-15 | — | — | CN | disclosed |
| CN-110777381-A | Composition for TiN hardmask removal and etch residue cleaning | 弗萨姆材料美国有限责任公司 | 2020-02-11 | — | — | CN | disclosed |