SCHEMBL28419136

SCHEMBL28419136

C=COC(=O)C1C=CC=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28708654 0.71
SCHEMBL19506921 0.67 ALDH1A1 (0.32)
SCHEMBL1463867 0.67 ALDH1A1 (0.45)
SCHEMBL22654526 0.66
SCHEMBL1261020 0.65
SCHEMBL19506913 0.65 KMT2A (0.32)
SCHEMBL28750893 0.65 ALDH1A1 (0.33)
SCHEMBL295509 0.65 KMT2A (0.41)
SCHEMBL27608813 0.65 ALDH1A1 (0.33)
SCHEMBL27590444 0.65 ALDH1A1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109790391-B Curable resin composition for forming easily peelable film and method for producing same 大阪有机化学工业株式会社 2022-04-12 CN disclosed
CN-111936573-A Curable resin composition for forming heat-resistant and easily peelable cured resin film, and method for producing same 大阪有机化学工业株式会社 2020-11-13 CN disclosed
CN-109564797-B Film touch sensor and structure including the same 东友精细化工有限公司 2020-06-26 CN disclosed
CN-109790391-A Curable resin composition for forming easily peelable film and method for producing same 大阪有机化学工业株式会社 2019-05-21 CN disclosed