SCHEMBL284231

SCHEMBL284231

COCC1CO1.CO[SiH](OC)OC

nearest known ligand 0.43

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.43
ALDH1A1 P00352 10/20 0.43
TDP1 Q9NUW8 3/20 0.41
TSHR P16473 5/20 0.40
MAPK1 P28482 1/20 0.40
GLA P06280 1/20 0.34
PDK1 Q15118 2/20 0.33
TP53 P04637 4/20 0.32
MAPT P10636 2/20 0.32
HPGD P15428 2/20 0.32
HIF1A Q16665 2/20 0.32
CYP3A4 P08684 2/20 0.32
MEN1 O00255 1/20 0.32
CYP1A2 P05177 1/20 0.32
KMT2A Q03164 1/20 0.32
PPARG P37231 1/20 0.32
PKM P14618 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL334659 0.87
SCHEMBL30341 0.87
SCHEMBL334658 0.87
SCHEMBL17090758 0.86 SMN1; SMN2 (0.54) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1
SCHEMBL27524327 0.86 SMN1; SMN2 (0.54) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1
SCHEMBL16809957 0.85 ALDH1A1 (0.50) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1
Methane SCHEMBL11336685 0.85
Water SCHEMBL27874617 0.84 SMN1; SMN2 (0.52) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1
Cyclohexane SCHEMBL663995 0.82 ALDH1A1 (0.48) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1
SCHEMBL3660412 0.82 ALDH1A1 (0.48) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024071312-A1 CRYSTALLINE TITANIUM OXIDE CORE-SHELL PARTICLES AND DISPERSION CONTAINING SAME 日揮触媒化成株式会社 2024-04-04 WO disclosed
EP-4332178-A1 COATING COMPOSITION FOR FORMING HARD COATING LAYER, METHOD FOR PRODUCING SAME, SUBSTRATE WITH HARD COATING LAYER, AND METHOD FOR PRODUCING SAME JGC Catalysts and Chemicals Ltd. (JP) 2024-03-06 EP disclosed
WO-2023171514-A1 LAMINATE AND PACKAGING MATERIAL DIC株式会社 2023-09-14 WO disclosed
WO-2022264906-A1 PRIMER COMPOSITION FOR INORGANIC OXIDE VAPOR DEPOSITION, CURED PRODUCT AND MULTILAYER BODY DIC株式会社 2022-12-22 WO disclosed
EP-2796513-B1 COATING COMPRISING OLIGOMER-MODIFIED FINE PARTICLES, METHOD FOR PRODUCING SAID PARTICLES JGC CATALYSTS & CHEMICALS LTD (JP) 2022-02-02 EP disclosed
CN-111032801-B Coating composition for forming hard coat layer and optical member 日挥触媒化成株式会社 2021-08-24 CN disclosed
EP-2447211-B1 METHOD FOR PRODUCING SILICA-BASED FINE PARTICLE-DISPERSED SOL,SILICA-BASED FINE PARTICLE-DISPERSED SOL OBTAINED THEREBY AND APPLICATIONS THEREOF JGC CATALYSTS & CHEMICALS LTD (JP) 2020-08-05 EP disclosed
EP-3677654-A1 PAINT COMPOSITION FOR FORMING HARDCOAT LAYER, AND OPTICAL COMPONENT JGC Catalysts and Chemicals Ltd. (JP) 2020-07-08 EP disclosed
US-20200181452-A1 Coating Composition for Forming Hardcoat Layer, and Optical Component JGC CATALYSTS AND CHEMICALS LTD. (JP) 2020-06-11 US disclosed
CN-111032801-A Coating composition for forming hard coat layer and optical member 日挥触媒化成株式会社 2020-04-17 CN disclosed
EP-1947155-A1 COMPOSITION FOR USE IN THE FORMATION OF HARDCOAT LAYER AND OPTICAL LENS Catalysts & Chemicals Industries Co., Ltd. (JP) 2008-07-23 EP disclosed
EP-1925631-A1 COMPOSITE POLYMER, THERMOSETTING COATING COMPOSITION, AND MOLDED ARTICLE CATALYSTS & CHEMICALS INDUSTRIES CO., LTD. (JP) 2008-05-28 EP disclosed
EP-1895333-A1 Hard coating composition and plastic optical product Tokai Optical Co., Ltd. (JP) 2008-03-05 EP disclosed
US-20080050601-A1 Hard coating composition and plastic optical product TOKAI OPTICAL CO., LTD. (JP) 2008-02-28 US disclosed
US-7335539-B2 Method for making thin-film semiconductor device SONY CORPORATION (JP) 2008-02-26 US disclosed
US-20070298550-A1 Method for making thin-film semiconductor device SONY CORPORATION (JP) 2007-12-27 US disclosed
US-7273774-B2 Method for making thin-film semiconductor device SONY CORPORATION (JP) 2007-09-25 US disclosed
EP-1785458-A1 COATING LIQUID FOR FORMING TRANSPARENT COATING FILM AND BASE WITH TRANSPARENT COATING FILM CATALYSTS & CHEMICALS INDUSTRIES CO., LTD. (JP) 2007-05-16 EP disclosed
US-20060079033-A1 Method for making thin-film semiconductor device SONY CORPORATION (JP) 2006-04-13 US disclosed
US-20050181566-A1 Method for doping impurities, methods for producing semiconductor device and applied electronic apparatus SONY CORPORATION (JP) 2005-08-18 US disclosed