SCHEMBL28429439

SCHEMBL28429439

CCOC(C)OC(C)O[Ti]

nearest known ligand 0.55

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.55
THRB P10828 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28508654 0.86
SCHEMBL27064 0.86 LMNA (0.73) LMNATHRB
SCHEMBL10839922 0.83 LMNA (0.69) LMNATHRB
SCHEMBL28957828 0.83 LMNA (0.69) LMNATHRB
Ethylene Glycol SCHEMBL11100036 0.76 LMNA (0.58) LMNATHRB
SCHEMBL272528 0.75
SCHEMBL9459 0.73
SCHEMBL2094168 0.73 LMNA (1.00) LMNATHRB
SCHEMBL8865888 0.72 LMNA (0.52) LMNATHRB
SCHEMBL5604223 0.72 LMNA (0.52) LMNATHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111423587-B Thermosetting silicon-containing compound, composition for forming silicon-containing film, and method for forming pattern 信越化学工业株式会社 2023-01-31 CN disclosed
CN-112526822-A Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2021-03-19 CN disclosed
CN-111458980-A Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2020-07-28 CN disclosed
CN-111423587-A Thermosetting silicon-containing compound, composition for forming silicon-containing film, and method for forming pattern 信越化学工业株式会社 2020-07-17 CN disclosed