SCHEMBL2843100

SCHEMBL2843100

CCCC(C)COCC(C)CC

nearest known ligand 0.42

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.42
HSD17B10 Q99714 1/20 0.32
EPHX2 P34913 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19643118 0.92 TSHR (0.48) TSHRHSD17B10EPHX2
SCHEMBL9679319 0.92 TSHR (0.48) TSHRHSD17B10EPHX2
SCHEMBL10789496 0.89 TSHR (0.46) TSHRHSD17B10EPHX2
Calcium SCHEMBL10786902 0.89 TSHR (0.46) TSHRHSD17B10EPHX2
Lithium SCHEMBL8617111 0.89 TSHR (0.46) TSHRHSD17B10EPHX2
Barium SCHEMBL10787198 0.89 TSHR (0.46) TSHRHSD17B10EPHX2
SCHEMBL10632086 0.89 TSHR (0.46) TSHRHSD17B10EPHX2
Magnesium SCHEMBL8460788 0.89 TSHR (0.46) TSHRHSD17B10EPHX2
Potassium SCHEMBL10629925 0.89 TSHR (0.46) TSHRHSD17B10EPHX2
SCHEMBL20842923 0.87 HSD17B10 (0.39) TSHRHSD17B10EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8349549-B2 Resist surface modifying liquid, and method for formation of resist pattern using the same TOKYO OHKA KOGYO CO., LTD. (JP) 2013-01-08 US disclosed
US-20100129758-A1 Resist surface modifying liquid, and method for formation of resist pattern using the same TOKYO OHKA KOGYO CO., LTD. 2010-05-27 US disclosed