Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL2328918 | 0.98 | — | — | |
| Sulfuric Acid SCHEMBL27636185 | 0.98 | — | — | |
| Sulfuric Acid SCHEMBL29289505 | 0.96 | — | — | |
| Sulfuric Acid SCHEMBL29289504 | 0.96 | — | — | |
| SCHEMBL27656260 | 0.92 | — | — | |
| Sulfuric Acid SCHEMBL27918684 | 0.91 | — | — | |
| SCHEMBL28645622 | 0.90 | TSHR (0.31) | — | |
| Fluoride SCHEMBL29091478 | 0.90 | — | — | |
| SCHEMBL28626313 | 0.90 | TSHR (0.31) | — | |
| SCHEMBL28204091 | 0.90 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112086564-A | Passivating agent and passivation method thereof and method for preparing semiconductor film | 杭州纤纳光电科技有限公司 | 2020-12-15 | — | — | CN | disclosed |
| CN-111435705-A | Repairing agent and repairing method thereof and method for preparing photoelectric film | 杭州纤纳光电科技有限公司 | 2020-07-21 | — | — | CN | disclosed |