Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2222438 | 0.77 | — | — | |
| SCHEMBL27468276 | 0.77 | ALDH1A1 (0.38) | ALDH1A1HSD17B10TDP1LMNATSHR | |
| SCHEMBL8630003 | 0.75 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL16573040 | 0.73 | ALDH1A1 (0.35) | ALDH1A1HSD17B10LMNATSHR | |
| SCHEMBL22026740 | 0.73 | TDP1 (0.35) | HSD17B10TDP1LMNATSHR | |
| SCHEMBL17688550 | 0.73 | — | — | |
| SCHEMBL11528573 | 0.65 | ALDH1A1 (0.36) | ALDH1A1HSD17B10TDP1LMNATSHR | |
| SCHEMBL8362401 | 0.64 | ALDH1A1 (0.35) | ALDH1A1HSD17B10LMNATSHR | |
| SCHEMBL133026 | 0.64 | NQO1 (0.41) | ALDH1A1HSD17B10TDP1LMNATSHR | |
| SCHEMBL295140 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107315318-B | Photosensitive composition | 东京应化工业株式会社 | 2022-07-01 | — | — | CN | disclosed |
| CN-107311889-B | Compound and method for producing same | 东京应化工业株式会社 | 2022-01-14 | — | — | CN | disclosed |
| CN-106483764-B | Photosensitive composition, pattern forming method, cured product, and display device | 东京应化工业株式会社 | 2021-03-30 | — | — | CN | disclosed |
| CN-112394617-A | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film | 东京应化工业株式会社 | 2021-02-23 | — | — | CN | disclosed |
| CN-111796482-A | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film | 东京应化工业株式会社 | 2020-10-20 | — | — | CN | disclosed |