Butanal

Butanal

SCHEMBL284804

CCCC=O.[Ta]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Butanal SCHEMBL807 0.96
Butanal SCHEMBL597713 0.96 ALDH1A1 (1.00)
Butanal SCHEMBL9303364 0.96 ALDH1A1 (1.00)
Butanal SCHEMBL7323870 0.96
Butanal SCHEMBL23854344 0.92
Butanal SCHEMBL2049306 0.92
Butanal SCHEMBL14973385 0.92
Butanal SCHEMBL21142995 0.92
Butanal SCHEMBL28908 0.92
Butanal SCHEMBL490038 0.92

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 324 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119753624-A Semiconductor thermal field structural member and preparation method thereof 比亚迪股份有限公司 2025-04-04 CN claimed
CN-119433594-A Lignin derived carbon-alloy-metal oxide heterojunction catalyst and preparation method thereof 广西大学 2025-02-14 CN claimed
US-20240384113-A1 Compositions and Methods for Deposition of Ultrathin Nanoparticle Films THE BOEING COMPANY (US) 2024-11-21 US claimed
EP-4464753-A1 COMPOSITIONS AND METHODS FOR DEPOSITION OF ULTRATHIN NANOPARTICLE FILMS The Boeing Company (US) 2024-11-20 EP claimed
CN-116813383-B Tantalum carbide coating and preparation method thereof 中电化合物半导体有限公司 2024-08-13 CN claimed
CN-118345340-A High-temperature-resistant and oxidation-resistant YTO coating for tungsten alloy and preparation method thereof 南昌大学 2024-07-16 CN claimed
CN-118345437-A Preparation method of iridium tantalum titanium anode with low iridium content 西安泰金新能科技股份有限公司 2024-07-16 CN claimed
CN-114220959-B Preparation method of component-controllable multielement doped high-nickel ternary positive electrode material 天津巴莫科技有限责任公司 2024-07-09 CN claimed
CN-118156451-A Preparation method of synergistically modified ternary positive electrode material 哈尔滨工业大学 2024-06-07 CN claimed
CN-117448845-A Ternary electrolyzed water catalyst and preparation method and application thereof 华能张掖能源有限公司 2024-01-26 CN claimed
US-20120091406-A1 NANOCRYSTAL-METAL OXIDE-POLYMER COMPOSITES AND PREPARATION METHOD THEREOF SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-04-19 US claimed
US-20110300721-A1 Methods of Making Crystalline Tantalum Pentoxide MICRON TECHNOLOGY, INC. (US) 2011-12-08 US claimed
US-8012532-B2 Methods of making crystalline tantalum pentoxide MICRON TECHNOLOGY, INC. (US) 2011-09-06 US claimed
EP-2290008-A2 Transparent siloxane resin composition for optical applications Korea Advanced Institute of Science and Technology (KR) 2011-03-02 EP claimed
US-20110034581-A1 Transparent Siloxane Resin Composition for Optical Applications KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2011-02-10 US claimed
EP-2223957-A1 Transparent composite compound Korea Advanced Institute of Science and Technology (KR) 2010-09-01 EP claimed
US-20100178478-A1 TRANSPARENT COMPOSITE COMPOUND KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (JP) 2010-07-15 US claimed
EP-2157624-A1 Resin composition for led encapsulation Korea Advanced Institute of Science and Technology (KR) 2010-02-24 EP claimed
US-20100025724-A1 Resin Composition for LED Encapsulation KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2010-02-04 US claimed
US-20090155486-A1 METHODS OF MAKING CRYSTALLINE TANTALUM PENTOXIDE MICRON TECHNOLOGY, INC. (US) 2009-06-18 US claimed