SCHEMBL2848295

SCHEMBL2848295

Nc1ccccc1-c1cccc2cc3ccccc3cc12

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 12/20 0.54
L3MBTL1 Q9Y468 2/20 0.54
HSD17B10 Q99714 8/20 0.46
HPGD P15428 5/20 0.46
TSHR P16473 4/20 0.46
CYP3A4 P08684 4/20 0.46
KEAP1 Q14145 2/20 0.46
GAA P10253 4/20 0.46
KDM4E B2RXH2 3/20 0.46
KMT2A Q03164 2/20 0.46
NPC1 O15118 1/20 0.46
LMNA P02545 1/20 0.46
GLA P06280 1/20 0.46
POLB P06746 1/20 0.46
PTBP1 P26599 1/20 0.46
RAB9A P51151 1/20 0.46
RCE1 Q9Y256 1/20 0.46
MEN1 O00255 1/20 0.41
MAPT P10636 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Biphenyl SCHEMBL21796064 0.93 ALDH1A1 (0.50) ALDH1A1L3MBTL1HSD17B10HPGDTSHR
SCHEMBL23607812 0.88 ALDH1A1 (0.43) ALDH1A1L3MBTL1HSD17B10HPGDTSHR
SCHEMBL2871930 0.87 ALDH1A1 (0.50) ALDH1A1L3MBTL1HSD17B10HPGDTSHR
SCHEMBL29354014 0.87 ALDH1A1 (0.50) ALDH1A1L3MBTL1HSD17B10HPGDTSHR
SCHEMBL29538643 0.84 ALDH1A1 (0.48) ALDH1A1L3MBTL1HSD17B10HPGDTSHR
SCHEMBL537002 0.84 ALDH1A1 (0.52) ALDH1A1L3MBTL1HSD17B10HPGDTSHR
SCHEMBL27506937 0.84 ALDH1A1 (0.48) ALDH1A1L3MBTL1HSD17B10HPGDTSHR
SCHEMBL168479 0.82 ALDH1A1 (0.61) ALDH1A1L3MBTL1HSD17B10HPGDTSHR
SCHEMBL31298085 0.82 ALDH1A1 (0.61) ALDH1A1L3MBTL1HSD17B10HPGDTSHR
SCHEMBL29364651 0.82 ALDH1A1 (0.61) ALDH1A1L3MBTL1HSD17B10HPGDTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0929841-A4 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT MKE QUANTUM COMPONENTS COLORAD (US) 2001-04-18 EP claimed
US-5955244-A Method for forming photoresist features having reentrant profiles using a basic agent QUANTUM CORPORATION (US) 1999-09-21 US claimed
EP-0929841-A1 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT Mke-Quantum Components Colorado LLC (US) 1999-07-21 EP claimed
WO-1998008143-A1 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT MKE-QUANTUM COMPONENTS COLORADO LLC (US) 1998-02-26 WO claimed
EP-3620459-B9 PHOSPHORUS-CONTAINING PHENOLIC COMPOUND, PHOSPHORUS-CONTAINING EPOXY RESIN, CURABLE RESIN COMPOSITION THEREOF, OR EPOXY RESIN COMPOSITION AND CURED PRODUCT THEREOF NIPPON STEEL CHEMICAL & MAT CO LTD (JP) 2023-10-04 EP disclosed
EP-3620459-B1 PHOSPHORUS-CONTAINING PHENOLIC COMPOUND, PHOSPHORUS-CONTAINING EPOXY RESIN, CURABLE RESIN COMPOSITION THEREOF, OR EPOXY RESIN COMPOSITION AND CURED PRODUCT THEREOF NIPPON STEEL CHEMICAL & MAT CO LTD (JP) 2023-05-24 EP disclosed
US-20200199481-A1 GREASE COMPOSITIONS HAVING CALCIUM SULFONATE AND POLYUREA THICKENERS EXXONMOBIL RES & ENG CO (US) 2020-06-25 US disclosed
WO-2020131440-A1 GREASE COMPOSITIONS HAVING CALCIUM SULFONATE AND POLYUREA THICKENERS EXXONMOBIL RESEARCH AND ENGINEERING COMPANY (US) 2020-06-25 WO disclosed
CN-104379626-B Phosphorus-containing epoxy resin, composition containing the epoxy resin as essential component, and cured product 日铁化学材料株式会社 2019-03-22 CN disclosed
CN-109293881-A Phosphorous epoxy resin and using the epoxy resin as the composition of essential component, solidfied material 新日铁住金化学株式会社 2019-02-01 CN disclosed
CN-108753101-A A kind of epoxide powder coating and its application 张建洲 2018-11-06 CN disclosed
CN-108587400-A A kind of magnet ring two-component insulating coating 张建洲 2018-09-28 CN disclosed
US-6919301-B2 Grease composition and rolling apparatus NSK LTD. (JP) 2005-07-19 US disclosed
US-20030176298-A1 Grease composition and rolling apparatus NSK LTD. (JP) 2003-09-18 US disclosed
EP-0929841-A4 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT MKE QUANTUM COMPONENTS COLORAD (US) 2001-04-18 EP disclosed
US-5955244-A Method for forming photoresist features having reentrant profiles using a basic agent QUANTUM CORPORATION (US) 1999-09-21 US disclosed
EP-0929841-A1 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT Mke-Quantum Components Colorado LLC (US) 1999-07-21 EP disclosed
WO-1998008143-A1 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT MKE-QUANTUM COMPONENTS COLORADO LLC (US) 1998-02-26 WO disclosed
CN-1016349-B Method for preparing high-solubility aromatic polyimide DU PONT (US) 1992-04-22 CN disclosed
CN-1036965-A HIGHLY SOLUBLE AROMATIC POLYIMIDES DU PONT (US) 1989-11-08 CN disclosed