⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL28416500 | 1.00 | — | — | |
| Fluoride SCHEMBL701965 | 1.00 | — | — | |
| Fluoride SCHEMBL27715055 | 1.00 | — | — | |
| Fluoride SCHEMBL623572 | 0.82 | — | — | |
| Fluoride SCHEMBL3038548 | 0.82 | — | — | |
| Fluoride SCHEMBL8051073 | 0.82 | — | — | |
| Fluoride SCHEMBL2814762 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL21647192 | 0.82 | — | — | |
| Fluoride SCHEMBL16237737 | 0.82 | — | — | |
| Fluoride SCHEMBL17600626 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101421859-B | GaN-based semiconductor light emitting device and method of manufacturing the same | SHOWA DENKO KK | 2011-03-30 | — | — | CN | claimed |
| CN-101429092-A | Process for the treatment of the by-products from a reaction for the production of organic compounds | SOLVAY (BE) | 2009-05-13 | — | — | CN | claimed |
| CN-101421859-A | GaN-based semiconductor light emitting device and method of manufacturing the same | SHOWA DENKO KK (JP) | 2009-04-29 | — | — | CN | claimed |
| CN-1545494-A | Method for treating by-products from reactions for producing organic compounds | 索尔维公司 | 2004-11-10 | — | — | CN | claimed |
| US-6627001-B2 | Method for cleaning a semiconductor wafer | MACRONIX INTERNATIONAL CO., LTD. (TW) | 2003-09-30 | — | — | US | claimed |
| US-20020166572-A1 | Method for cleaning a semiconductor wafer | MACRONIX INTERNATIONAL CO., LTD. (TW) | 2002-11-14 | — | — | US | claimed |
| CN-108807223-B | Substrate processing apparatus and substrate processing method | 株式会社斯库林集团 | 2022-03-01 | — | — | CN | disclosed |
| CN-110416184-B | Semiconductor structure and forming method thereof | 台湾积体电路制造股份有限公司 | 2021-10-08 | — | — | CN | disclosed |
| CN-108336127-B | Silicon carbide substrate, semiconductor device, and methods for manufacturing silicon carbide substrate and semiconductor device | 住友电气工业株式会社 | 2021-09-24 | — | — | CN | disclosed |
| CN-110416184-A | Semiconductor structure and forming method thereof | TAIWAN SEMICONDUCTOR MFG CO LTD | 2019-11-05 | — | — | CN | disclosed |
| CN-108886005-A | Concentration of carbon measuring method, the manufacturing method of silicon single crystal ingot, silicon single crystal ingot and the silicon wafer of silicon sample | 胜高股份有限公司 | 2018-11-23 | — | — | CN | disclosed |
| CN-108807223-A | Substrate processing apparatus and substrate processing method | 株式会社斯库林集团 | 2018-11-13 | — | — | CN | disclosed |
| CN-108336127-A | Silicon carbide substrates, semiconductor device and their manufacturing method | 住友电气工业株式会社 | 2018-07-27 | — | — | CN | disclosed |
| US-20030134491-A1 | Vapor growth method, semiconductor producing method, and production method for semiconductor device | SONY CORPORATION (JP) | 2003-07-17 | — | — | US | disclosed |
| CN-1363540-A | Catalyst system for ethylene oligomerization and its preparing process and application | CHINESE ACAD INST CHEMISTRY (CN) | 2002-08-14 | — | — | CN | disclosed |
| US-6416586-B1 | MULTISTAGE PROCESS; USING AQUEOUS SOLUTION | Ohmi, Tadahiro (JP) | 2002-07-09 | — | — | US | disclosed |
| US-6325081-B1 | Washing apparatus and washing method | KABUSHIKI KAISHA ULTRACLEAN TECHNOLOGY RESEARCH INSTITUTE (JP) | 2001-12-04 | — | — | US | disclosed |
| US-6058945-A | Cleaning methods of porous surface and semiconductor surface | CANON KABUSHIKI KAISHA (JP) | 2000-05-09 | — | — | US | disclosed |
| EP-0810643-A2 | Method for cleaning a porous surface of a semiconductor substrate | CANON KABUSHIKI KAISHA (JP) | 1997-12-03 | — | — | EP | disclosed |
| CN-1166693-A | Cleaning methods of porous surface and semiconductor surface | CANON KK (JP) | 1997-12-03 | — | — | CN | disclosed |