⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL2853593 | 1.00 | — | — | |
| Fluoride SCHEMBL28416500 | 1.00 | — | — | |
| Fluoride SCHEMBL27715055 | 1.00 | — | — | |
| Fluoride SCHEMBL623572 | 0.82 | — | — | |
| Fluoride SCHEMBL3038548 | 0.82 | — | — | |
| Fluoride SCHEMBL8051073 | 0.82 | — | — | |
| Fluoride SCHEMBL2814762 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL21647192 | 0.82 | — | — | |
| Fluoride SCHEMBL16237737 | 0.82 | — | — | |
| Fluoride SCHEMBL17600626 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116272310-A | System and method for treating tail gas from lithium hexafluorophosphate production | 华陆工程科技有限责任公司 | 2023-06-23 | — | — | CN | claimed |
| CN-111423305-A | Separation method of five-membered cyclic fluorochloroolefin and hydrogen fluoride azeotropic mixture | 北京宇极科技发展有限公司 | 2020-07-17 | — | — | CN | claimed |
| CN-108376570-B | FLiNaK molten salt, preparation method thereof, reactor and preparation device | 中国科学院上海应用物理研究所 | 2019-12-10 | — | — | CN | claimed |
| CN-108376570-A | A kind of FLiNaK fused salts and preparation method thereof, reactor and preparation facilities | 中国科学院上海应用物理研究所 | 2018-08-07 | — | — | CN | claimed |
| CN-117500749-A | Purification method and device for ultra-high purity hydrogen fluoride | 蓝泰科电子材料股份公司 | 2024-02-02 | — | — | CN | disclosed |
| CN-116272310-A | System and method for treating tail gas from lithium hexafluorophosphate production | 华陆工程科技有限责任公司 | 2023-06-23 | — | — | CN | disclosed |
| CN-116272310-A | System and method for treating tail gas from lithium hexafluorophosphate production | 华陆工程科技有限责任公司 | 2023-06-23 | — | — | CN | disclosed |
| CN-106406021-B | Protective film and photomask assembly including the same | 三星电子株式会社 | 2021-09-14 | — | — | CN | disclosed |
| EP-2423356-B1 | PROCESS FOR PRODUCING INDIUM-PHOSPHORUS SUBSTRATE AND PROCESS FOR PRODUCING EPITAXIAL WAFER | SUMITOMO ELECTRIC INDUSTRIES (JP) | 2020-10-07 | — | — | EP | disclosed |
| CN-108376570-B | FLiNaK molten salt, preparation method thereof, reactor and preparation device | 中国科学院上海应用物理研究所 | 2019-12-10 | — | — | CN | disclosed |
| CN-110494961-A | Composite relative to silicon selective etch silicon-germanium | ENTEGRIS INC | 2019-11-22 | — | — | CN | disclosed |
| CN-110358532-A | Rear-earth-doped alkaline earth metal fluorohalide nano luminescent material and its preparation method and application | 中国科学院福建物质结构研究所 | 2019-10-22 | — | — | CN | disclosed |
| US-6124209-A | SURFACE OF A SILICON SINGLE CRYSTAL IS EXPOSED TO A MIXED GAS OF HYDROGEN FLUORIDE AND HYDROGEN AT 0 DEGREE-100.DEGREE C. TO REMOVE A NATURAL OXIDE FORMED ON THE SURFACE OF SILICON SINGLE CRYSTAL, THEN GROWING A SILICON SINGLE CRYSTAL FILM | SHIN-ETSU HANDOTAI CO., LTD. (JP) | 2000-09-26 | — | — | US | disclosed |
| CN-1189393-A | Microcapsules using iminooxadiazinedione polyisocyanates | BAYER AG (DE) | 1998-08-05 | — | — | CN | disclosed |
| EP-0848088-A1 | A method for treating a suface of a silicon single crystal and a method for manufacturing a silicon single crystal thin film | SHIN-ETSU HANDOTAI COMPANY LIMITED (JP) | 1998-06-17 | — | — | EP | disclosed |
| CN-1121064-A | Process for preparing trifluoroacetyl fluoride | HOECHST AG (DE) | 1996-04-24 | — | — | CN | disclosed |
| CN-1017728-B | Chemical method for removing stainless steel oxide layer | SUN YONGCHUN (CN) | 1992-08-05 | — | — | CN | disclosed |
| CN-1055534-A | Preparation 1,1,1-trifluoro-chloroethane and 1,1,1, the method for 2-Tetrafluoroethane | DAIKIN IND LTD (JP) | 1991-10-23 | — | — | CN | disclosed |
| WO-1989002416-A1 | INTEGRATED COAL CLEANING PROCESS WITH MIXED ACID REGENERATION | WILLIAMS TECHNOLOGIES, INC. (US) | 1989-03-23 | — | — | WO | disclosed |
| US-4695290-A | Integrated coal cleaning process with mixed acid regeneration | INTEGRATED CARBONS CORPORATION (US) | 1987-09-22 | — | — | US | disclosed |