SCHEMBL2854332

SCHEMBL2854332

FC(F)=C(OC(=C(F)F)C(F)(F)C(F)(C(F)(F)F)C(F)(F)F)C(F)(F)C(F)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL58691 0.82
SCHEMBL51860 0.78
SCHEMBL2849810 0.76 THRB (0.39)
SCHEMBL8939821 0.74 THRB (0.42)
SCHEMBL7174534 0.72
SCHEMBL3628931 0.72
SCHEMBL3467648 0.72
SCHEMBL4610751 0.72
SCHEMBL51295 0.69
SCHEMBL10383613 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1095938-B1 OXETANE COMPOUNDS, OXETANE COPOLYMER, AND PROCESS FOR PRODUCING OXETANE COMPOUNDS JSR CORP (JP) 2010-01-20 EP disclosed
US-6495636-B2 A 3-(ETHYLENEOXYALKYLOXYALKYL)OXETANE AND DERIVATIVES; COPOLYMERIZED WITH A 1,1-DIFLUOROETHYLENE OR DERIVATIVE; VERY COMPATIBLE AND COPOLYMERIZABLE WITH UNSATURATED COMPOUNDS; WATERPROOFING; RADIATION TRANSPARENT JSR CORPORATION (JP) 2002-12-17 US disclosed
US-20010002423-A1 Oxetane compound, oxetane copolymer, and process for producing the oxetane compound SUGIYAMA NAOKI (JP) 2001-05-31 US disclosed
EP-1095938-A1 OXETANE COMPOUNDS, OXETANE COPOLYMER, AND PROCESS FOR PRODUCING OXETANE COMPOUNDS JSR Corporation (JP) 2001-05-02 EP disclosed
US-4058578-A DISPERSION HOECHST AKTIENGESELLSCHAFT (DT) 1977-11-15 US disclosed