SCHEMBL28544133

SCHEMBL28544133

C1CCC(P(C2CCCCC2)C2CCCCC2)CC1.O=C1C=CC=CC1C=[Ru](I)(I)(I)I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29350879 0.83
SCHEMBL29008387 0.81
SCHEMBL23781930 0.77
SCHEMBL29353765 0.66
SCHEMBL27552776 0.63
SCHEMBL29496384 0.61 ALDH1A1 (0.32)
SCHEMBL1161763 0.60
SCHEMBL29861097 0.59
Hydrochloric Acid SCHEMBL6862031 0.59 ALDH1A1 (0.30)
Hydrochloric Acid SCHEMBL1898817 0.59 ALDH1A1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112335252-B Polycycloolefin monomer as 3D printing material and catalyst activated by compound capable of generating photoacid 住友电木株式会社 2023-07-04 CN claimed
CN-112335252-A Polycycloolefinic monomers as 3D printing materials and catalysts activated by compounds capable of generating photoacid 普罗米鲁斯有限责任公司 2021-02-05 CN claimed
CN-112335252-B Polycycloolefin monomer as 3D printing material and catalyst activated by compound capable of generating photoacid 住友电木株式会社 2023-07-04 CN disclosed
CN-112335252-A Polycycloolefinic monomers as 3D printing materials and catalysts activated by compounds capable of generating photoacid 普罗米鲁斯有限责任公司 2021-02-05 CN disclosed