⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20582655 | 0.85 | CNR2 (0.38) | — | |
| SCHEMBL2655550 | 0.81 | — | — | |
| SCHEMBL28685155 | 0.81 | — | — | |
| SCHEMBL22749515 | 0.79 | — | — | |
| SCHEMBL11406028 | 0.77 | EPHX1 (0.45) | — | |
| SCHEMBL4660514 | 0.77 | — | — | |
| SCHEMBL5711856 | 0.77 | — | — | |
| SCHEMBL28555210 | 0.76 | — | — | |
| SCHEMBL31522722 | 0.76 | CNR2 (0.33) | — | |
| SCHEMBL15847268 | 0.76 | EPHX1 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107315318-B | Photosensitive composition | 东京应化工业株式会社 | 2022-07-01 | — | — | CN | disclosed |
| CN-107311889-B | Compound and method for producing same | 东京应化工业株式会社 | 2022-01-14 | — | — | CN | disclosed |
| CN-106483764-B | Photosensitive composition, pattern forming method, cured product, and display device | 东京应化工业株式会社 | 2021-03-30 | — | — | CN | disclosed |