⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28547979 | 0.81 | — | — | |
| SCHEMBL20582655 | 0.79 | CNR2 (0.38) | — | |
| SCHEMBL25418892 | 0.79 | — | — | |
| Hydrochloric Acid SCHEMBL7544459 | 0.77 | — | — | |
| SCHEMBL2655550 | 0.75 | — | — | |
| SCHEMBL1133058 | 0.75 | — | — | |
| SCHEMBL1260188 | 0.74 | — | — | |
| SCHEMBL22749515 | 0.73 | — | — | |
| SCHEMBL28513567 | 0.73 | KMT2A (0.35) | — | |
| SCHEMBL1232539 | 0.73 | ALDH1A1 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107315318-B | Photosensitive composition | 东京应化工业株式会社 | 2022-07-01 | — | — | CN | disclosed |
| CN-107311889-B | Compound and method for producing same | 东京应化工业株式会社 | 2022-01-14 | — | — | CN | disclosed |