Formaldehyde

Formaldehyde

SCHEMBL28554697

C=O.Ic1cccc2ccccc12

nearest known ligand 0.46

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.46
HSD17B10 Q99714 4/20 0.46
CYP2A6 P11509 3/20 0.46
TSHR P16473 2/20 0.46
TDP1 Q9NUW8 1/20 0.46
CYP1A2 P05177 4/20 0.42
HPGD P15428 2/20 0.42
CYP3A4 P08684 2/20 0.42
KEAP1 Q14145 1/20 0.42
HPRT1 P00492 1/20 0.42
NR4A1 P22736 1/20 0.41
NR4A2 P43354 1/20 0.41
NR4A3 Q92570 1/20 0.41
PARP1 P09874 1/20 0.41
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA9 Q16790 1/20 0.40
PTK2B Q14289 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
PAX8 Q06710 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL150739 0.92 ALDH1A1 (0.53) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL29416306 0.92 ALDH1A1 (0.53) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL9636086 0.90 ALDH1A1 (0.50) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL1316181 0.90 ALDH1A1 (0.50) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL12344949 0.87 ALDH1A1 (0.53) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL28746183 0.83 ALDH1A1 (0.43) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL7572482 0.83 ALDH1A1 (0.43) ALDH1A1HSD17B10CYP2A6TSHRTDP1
Acetic Acid SCHEMBL29051372 0.82 NR4A1 (0.50) ALDH1A1HSD17B10CYP2A6TDP1CYP1A2
Formaldehyde SCHEMBL28561333 0.79 ALDH1A1 (0.50) ALDH1A1HSD17B10TSHRCYP1A2HPGD
Chlorobenzene SCHEMBL5385393 0.79 CYP1A2 (0.48) ALDH1A1HSD17B10CYP2A6TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108137478-B Compound, composition thereof, purification method, resist pattern formation method, and amorphous film production method 三菱瓦斯化学株式会社 2021-09-28 CN disclosed
CN-107428717-B Resist composition, resist pattern forming method, and polyphenol compound used for same 三菱瓦斯化学株式会社 2021-04-23 CN disclosed