SCHEMBL28558209

SCHEMBL28558209

CC(=O)OCCNCCOC(=O)COC(=O)COC(=O)COC(=O)COC(C)=O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.42
CHRM5 P08912 2/20 0.42
CHRM1 P11229 2/20 0.42
CHRM3 P20309 2/20 0.42
PGR P06401 1/20 0.42
CHRM2 P08172 1/20 0.42
CHRM4 P08173 1/20 0.42
HTR1A P08908 1/20 0.42
CHRNB2 P17787 1/20 0.42
TBXA2R P21731 1/20 0.42
CHRNB4 P30926 1/20 0.42
CHRNA3 P32297 1/20 0.42
CHRNA7 P36544 1/20 0.42
CHRNA4 P43681 1/20 0.42
CHRNA10 Q9GZZ6 1/20 0.42
CHRNA9 Q9UGM1 1/20 0.42
GALR3 O60755 2/20 0.41
GAA P10253 1/20 0.41
RAB9A P51151 1/20 0.41
ALDH1A1 P00352 5/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28457567 1.00 SMN1; SMN2 (0.42) SMN1; SMN2CHRM5CHRM1CHRM3PGR
SCHEMBL28472725 1.00 SMN1; SMN2 (0.42) SMN1; SMN2CHRM5CHRM1CHRM3PGR
SCHEMBL28989095 1.00 SMN1; SMN2 (0.42) SMN1; SMN2CHRM5CHRM1CHRM3PGR
SCHEMBL28339842 1.00 SMN1; SMN2 (0.42) SMN1; SMN2CHRM5CHRM1CHRM3PGR
SCHEMBL28640823 1.00 SMN1; SMN2 (0.42) SMN1; SMN2CHRM5CHRM1CHRM3PGR
SCHEMBL28428968 1.00 SMN1; SMN2 (0.42) SMN1; SMN2CHRM5CHRM1CHRM3PGR
SCHEMBL28367477 1.00 SMN1; SMN2 (0.42) SMN1; SMN2CHRM5CHRM1CHRM3PGR
SCHEMBL68618 0.85 ALDH1A1 (0.50) SMN1; SMN2CHRM5CHRM1CHRM3PGR
SCHEMBL11208297 0.83 ALDH1A1 (0.52) SMN1; SMN2CHRM5CHRM1CHRM3PGR
Hydrochloric Acid SCHEMBL1062025 0.83 ALDH1A1 (0.48) SMN1; SMN2CHRM5CHRM1CHRM3PGR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108107676-B Chemically amplified positive resist film laminate and pattern formation method 信越化学工业株式会社 2023-02-21 CN disclosed
CN-106444288-B Chemically amplified positive resist composition and pattern forming method 信越化学工业株式会社 2021-04-09 CN disclosed