Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | OPRM1 | P35372 | 1/20 | 0.33 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.33 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.33 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL28263180 | 0.98 | OPRM1 (0.32) | OPRM1OPRD1OPRK1OPRL1 | |
| SCHEMBL2292865 | 0.79 | — | — | |
| SCHEMBL28003648 | 0.78 | OPRM1 (0.34) | OPRM1OPRD1OPRK1OPRL1 | |
| Methacrylic Acid SCHEMBL18421863 | 0.78 | TDP1 (0.33) | — | |
| Methacrylic Acid SCHEMBL14693728 | 0.78 | TDP1 (0.33) | — | |
| SCHEMBL1414825 | 0.77 | OPRM1 (0.36) | OPRM1OPRD1OPRK1OPRL1 | |
| SCHEMBL18268918 | 0.77 | OPRM1 (0.36) | OPRM1OPRD1OPRK1OPRL1 | |
| SCHEMBL17487284 | 0.77 | OPRM1 (0.36) | OPRM1OPRD1OPRK1OPRL1 | |
| Methacrylic Acid SCHEMBL1930431 | 0.76 | CYP2C19 (0.32) | — | |
| Methacrylic Acid SCHEMBL6083326 | 0.76 | CYP2C19 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115542665-B | Positive chemical amplification type photoresist and application method thereof | 徐州博康信息化学品有限公司 | 2025-03-07 | — | — | CN | claimed |
| CN-115542665-A | Positive chemical amplification type photoresist and using method thereof | 徐州博康信息化学品有限公司 | 2022-12-30 | — | — | CN | claimed |
| CN-115542665-B | Positive chemical amplification type photoresist and application method thereof | 徐州博康信息化学品有限公司 | 2025-03-07 | — | — | CN | disclosed |
| CN-115542665-A | Positive chemical amplification type photoresist and using method thereof | 徐州博康信息化学品有限公司 | 2022-12-30 | — | — | CN | disclosed |
| CN-112724015-A | Process for preparing alicyclic acrylic acid derivatives and composition comprising the same | 松原产业株式会社 | 2021-04-30 | — | — | CN | disclosed |