SCHEMBL28596995

SCHEMBL28596995

C=C(Cl)C(=O)OC(F)(C(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2445917 0.83
SCHEMBL6283826 0.83
SCHEMBL215220 0.80 ALDH1A1 (0.38)
SCHEMBL10892197 0.80
SCHEMBL16344015 0.79
SCHEMBL6283831 0.77
SCHEMBL10982418 0.76
SCHEMBL6915019 0.76 ALDH1A1 (0.39)
Methacrylic Acid SCHEMBL28978211 0.76 ALDH1A1 (0.34)
SCHEMBL2368409 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108369378-B Method of forming resist pattern 日本瑞翁株式会社 2021-07-20 CN disclosed