SCHEMBL28599306

SCHEMBL28599306

O[Si](O)(O)CCS

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL80512 0.77
SCHEMBL1056934 0.71
SCHEMBL375585 0.69
SCHEMBL20199350 0.67
SCHEMBL17063492 0.64
Propane SCHEMBL11871991 0.62
SCHEMBL7884136 0.61
SCHEMBL21550734 0.60
SCHEMBL27738705 0.59
SCHEMBL23581797 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260028489-A1 SUPPORTED POLYMERIZATION INHIBITORS AND THEIR USE IN CURABLE COMPOSITIONS FOR 3D PRINTING ALIGN TECHNOLOGY INC (US) 2026-01-29 US disclosed
CN-108602955-B Photocuring method, compound used in photocuring method, and composition 富士胶片和光纯药株式会社 2021-08-06 CN disclosed