⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4526138 | 0.83 | DNM1 (0.50) | — | |
| SCHEMBL9622662 | 0.83 | TSHR (0.50) | — | |
| SCHEMBL1686673 | 0.83 | TSHR (0.50) | — | |
| SCHEMBL1686672 | 0.83 | TSHR (0.50) | — | |
| SCHEMBL4527476 | 0.83 | DNM1 (0.50) | — | |
| SCHEMBL1686671 | 0.83 | TSHR (0.50) | — | |
| SCHEMBL12576119 | 0.83 | — | — | |
| SCHEMBL1687021 | 0.83 | TSHR (0.50) | — | |
| SCHEMBL4513418 | 0.83 | DNM1 (0.50) | — | |
| SCHEMBL9744969 | 0.83 | TSHR (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10995268-B2 | Etching composition effective to selectively wet etch a silicon nitride film | LTCAM CO., LTD. (KR) | 2021-05-04 | — | — | US | disclosed |
| US-6310020-B1 | POLYCARBOXYLIC ACID OR A SALT THEREOF, ORGANIC SILICON COMPOUND, WATER | KAO CORPORATION (JP) | 2001-10-30 | — | — | US | disclosed |