SCHEMBL28606323

SCHEMBL28606323

CCCCOCC(O)N1CCOCC1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 5/20 0.44
▸ SMN1; SMN2 Q16637 3/20 0.44
▸ POLB P06746 1/20 0.44
▸ ALDH1A1 P00352 5/20 0.40
▸ MAPK1 P28482 2/20 0.40
▸ CYP1A2 P05177 1/20 0.40
▸ CHRM2 P08172 1/20 0.40
▸ CHRM1 P11229 1/20 0.40
▸ HTR2A P28223 1/20 0.40
▸ SCN1A P35498 1/20 0.40
▸ HTR2B P41595 1/20 0.40
▸ KCNH2 Q12809 1/20 0.40
▸ SCN2A Q99250 1/20 0.40
▸ SIGMAR1 Q99720 1/20 0.40
▸ SCN3A Q9NY46 1/20 0.40
▸ HRH3 Q9Y5N1 1/20 0.40
▸ USP2 O75604 3/20 0.39
▸ KDM4E B2RXH2 1/20 0.39
▸ ALOX15 P16050 1/20 0.39
▸ HTT P42858 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28617506 0.82 ALDH1A1 (0.45) LMNAPOLBALDH1A1USP2HTT
SCHEMBL10603631 0.81 POLB (0.44) LMNAPOLBALDH1A1MAPK1USP2
SCHEMBL11411024 0.79 USP2 (0.34) LMNASMN1; SMN2ALDH1A1USP2MAPT
SCHEMBL28608364 0.78 ALDH1A1 (0.40) LMNASMN1; SMN2POLBALDH1A1USP2
SCHEMBL12761114 0.78 USP2 (0.59) SMN1; SMN2POLBALDH1A1MAPK1USP2
SCHEMBL20863035 0.77 KCNH2 (0.42) LMNASMN1; SMN2POLBALDH1A1MAPK1
SCHEMBL30777521 0.77 POLB (0.41) LMNAPOLBALDH1A1MAPK1USP2
SCHEMBL30777520 0.77 POLB (0.41) LMNAPOLBALDH1A1MAPK1USP2
SCHEMBL24352759 0.75 USP2 (0.41) LMNASMN1; SMN2POLBALDH1A1MAPK1
SCHEMBL11743635 0.75 KCNA5 (0.42) LMNASMN1; SMN2POLBALDH1A1KCNH2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107229191-B Photoresist removing composition and method for manufacturing electronic component using the same 达兴材料股份有限公司 2021-07-06 — — CN claimed
CN-107229191-B Photoresist removing composition and method for manufacturing electronic component using the same 达兴材料股份有限公司 2021-07-06 — — CN disclosed
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