Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7897552 | 0.69 | — | — | |
| Sulfuric Acid SCHEMBL2840688 | 0.68 | — | — | |
| SCHEMBL10553359 | 0.67 | — | — | |
| Sulfuric Acid SCHEMBL28642679 | 0.65 | CA5A (0.55) | CA5ACA5B | |
| Sulfuric Acid SCHEMBL3650810 | 0.65 | CA5A (0.55) | CA5ACA5B | |
| SCHEMBL491009 | 0.65 | — | — | |
| Sulfuric Acid SCHEMBL16448274 | 0.65 | CA5A (0.55) | CA5ACA5B | |
| Sulfuric Acid SCHEMBL28937744 | 0.62 | — | — | |
| SCHEMBL5632653 | 0.62 | — | — | |
| Sulfuric Acid SCHEMBL9621807 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113314402-B | Photoresist composition and method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2025-03-25 | — | — | CN | disclosed |
| CN-113311661-B | Photoresist underlayer composition and method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2024-10-15 | — | — | CN | disclosed |
| CN-109791359-B | Resist composition, method for forming resist pattern, polymer compound and copolymer | 东京应化工业株式会社 | 2022-10-11 | — | — | CN | disclosed |
| CN-108693703-B | Resist composition and resist pattern formation method | 东京应化工业株式会社 | 2022-09-23 | — | — | CN | disclosed |
| CN-115087928-A | Resist pattern forming method | 东京应化工业株式会社 | 2022-09-20 | — | — | CN | disclosed |
| CN-113311661-A | Photoresist underlayer composition and method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2021-08-27 | — | — | CN | disclosed |
| CN-113314402-A | Photoresist composition and method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2021-08-27 | — | — | CN | disclosed |
| CN-113311662-A | Method for manufacturing semiconductor device and photoresist composition | 台湾积体电路制造股份有限公司 | 2021-08-27 | — | — | CN | disclosed |