SCHEMBL2861584

SCHEMBL2861584

C/C(=C\c1ccccc1)S(=O)(=O)O

nearest known ligand 0.52

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 2/20 0.52
ALDH1A1 P00352 1/20 0.52
TSHR P16473 1/20 0.52
FBP1 P09467 1/20 0.47
RECQL P46063 1/20 0.44
HTT P42858 1/20 0.43
GLA P06280 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
PTGS2 P35354 1/20 0.42
AKR1C1 Q04828 1/20 0.41
KDM1A O60341 1/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
MTNR1A P48039 2/20 0.40
MTNR1B P49286 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL750813 1.00 AKR1C3 (0.52) AKR1C3ALDH1A1TSHRFBP1RECQL
SCHEMBL28849988 0.81 AKR1C3 (0.50) AKR1C3ALDH1A1TSHRFBP1RECQL
SCHEMBL4619195 0.81 AKR1C3 (0.50) AKR1C3ALDH1A1TSHRFBP1RECQL
SCHEMBL5419434 0.81 AKR1C3 (0.50) AKR1C3ALDH1A1TSHRFBP1RECQL
SCHEMBL11540895 0.81 AKR1C3 (0.50) AKR1C3ALDH1A1TSHRFBP1RECQL
SCHEMBL28850007 0.81 AKR1C3 (0.50) AKR1C3ALDH1A1TSHRFBP1RECQL
SCHEMBL5418658 0.81 AKR1C3 (0.50) AKR1C3ALDH1A1TSHRFBP1RECQL
SCHEMBL11540897 0.81 AKR1C3 (0.50) AKR1C3ALDH1A1TSHRFBP1RECQL
SCHEMBL3777809 0.79 PTGES2 (0.50) AKR1C3FBP1PTGS2AKR1C1
SCHEMBL3777810 0.79 PTGES2 (0.50) AKR1C3FBP1PTGS2AKR1C1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114105837-B Synthesis and application of alkenyl sulfonyl-containing molecules 中国科学院上海有机化学研究所 2023-05-12 CN disclosed
EP-1762894-B1 Photopolymerizable photosensitive lithographic printing plate FUJIFILM CORP (JP) 2013-01-09 EP disclosed
EP-1906244-B1 Photopolymerizable lithographic printing plate precursor FUJIFILM CORP (JP) 2012-08-08 EP disclosed
US-7767380-B2 Photopolymerization type photosensitive lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2010-08-03 US disclosed
EP-1516725-B1 Lithographic printing plate precursor FUJIFILM CORP (JP) 2010-05-05 EP disclosed
EP-1906244-A2 Photopolymerizable lithographic printing plate precursor FUJIFILM Corporation (JP) 2008-04-02 EP disclosed
US-20080076066-A1 PHOTOPOLYMERIZATION TYPE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR FUJIFILM CORPORATION (JP) 2008-03-27 US disclosed
EP-1762894-A1 Photopolymerizable photosensitive lithographic printing plate FUJIFILM Corporation (JP) 2007-03-14 EP disclosed
US-20070048663-A1 Photopolymerizable photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. 2007-03-01 US disclosed
US-20050064330-A1 planographic plates comprising supports, undercoatings and photosensitive layer containing infrared absorbing dyes, a polymerization initiator, a polymerizable compound and binder polymers, having high stability at the time of printing by image exposure and development, and storage stability FUJI PHOTO FILM CO., LTD. 2005-03-24 US disclosed
EP-0487343-B1 Process for preparing a lithographic plate FUJI PHOTO FILM CO LTD (JP) 1999-04-28 EP disclosed
US-5567568-A BLEND OF AN ETHYLENICALLY UNSATURATED ADDITION POLYMERIZABLE COMPOUND, AQUEOUS SWELLABLE POLYMER, PHOTOINITIATOR, DIAZO RESIN AND A COMPOUND THAT FLOATS ON SURFACE OF PHOTOSENSITIVE LAYER FUJI PHOTO FILM CO., LTD. (JP) 1996-10-22 US disclosed
EP-0487343-A1 Process for preparing a lithographic plate Fuji Photo Film Co., Ltd. (JP) 1992-05-27 EP disclosed
EP-0110417-B1 PRESENSITIZED LITHOGRAPHIC PLATE FUJI PHOTO FILM CO., LTD. (JP) 1991-03-20 EP disclosed
US-4578342-A Presensitized diazo lithographic plate with anodized and silicated aluminum plate surface and subbing layer of polymer with sulfonic acid group FUJI PHOTO FILM CO., LTD. (JP) 1986-03-25 US disclosed
US-4576893-A DIAZO RESIN, PYRIDINEDICARBOXYLIC ACID FUJI PHOTO FILM CO., LTD. (JP) 1986-03-18 US disclosed
US-4557994-A MICROPATTERN OF TERPOLYMER RESISTANT TO RUBBING AND PRESSURE FUJI PHOTO FILM CO., LTD. (JP) 1985-12-10 US disclosed
EP-0130488-A2 Presensitized lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 1985-01-09 EP disclosed
EP-0110417-A2 Presensitized lithographic plate FUJI PHOTO FILM CO., LTD. (JP) 1984-06-13 EP disclosed
EP-0092794-A2 Light-sensitive printing plate FUJI PHOTO FILM CO., LTD. (JP) 1983-11-02 EP disclosed