Acrylic Acid

Acrylic Acid

SCHEMBL28616593

C=CC(=O)O.C=CC(=O)O.CC(C)(C)CC(O)(O)C(C)(C)C(=O)O

nearest known ligand 0.40

Full drug profile on Sugi Atlas →

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.40
TET2 Q6N021 1/20 0.35
THRA P10827 2/20 0.33
THRB P10828 2/20 0.33
ALDH1A1 P00352 1/20 0.33
TSHR P16473 1/20 0.33
ALOX15 P16050 1/20 0.32
HSD17B10 Q99714 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL506135 0.87 TSHR (0.43) TET2ALDH1A1TSHR
Acrylic Acid SCHEMBL29072788 0.73 LMNA (0.53) LMNATET2THRATHRBALDH1A1
Acrylic Acid SCHEMBL7198697 0.72 LMNA (0.67) LMNATET2THRATHRBALDH1A1
Acrylic Acid SCHEMBL30623132 0.71 LMNA (0.43) LMNATHRATHRBALDH1A1TSHR
Acrylic Acid SCHEMBL30477513 0.71 LMNA (0.56) LMNATHRATHRBALDH1A1TSHR
Acrylic Acid SCHEMBL1015243 0.71 LMNA (0.56) LMNATHRATHRBALDH1A1TSHR
Acrylic Acid SCHEMBL4563264 0.71 LMNA (0.56) LMNATHRATHRBALDH1A1TSHR
Acrylic Acid SCHEMBL11403108 0.71 LMNA (0.56) LMNATET2THRATHRBALDH1A1
Acrylic Acid SCHEMBL30464037 0.71 LMNA (0.56) LMNATET2THRATHRBALDH1A1
Acrylic Acid SCHEMBL29550213 0.71 LMNA (0.56) LMNATHRATHRBALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113321912-B High-temperature-resistant 3D printing photosensitive resin and preparation method and application thereof 广东工业大学 2022-07-12 CN claimed
CN-113321912-A High-temperature-resistant 3D printing photosensitive resin and preparation method and application thereof 广东工业大学 2021-08-31 CN claimed
CN-113321912-B High-temperature-resistant 3D printing photosensitive resin and preparation method and application thereof 广东工业大学 2022-07-12 CN disclosed
CN-113321912-A High-temperature-resistant 3D printing photosensitive resin and preparation method and application thereof 广东工业大学 2021-08-31 CN disclosed