SCHEMBL2861882

SCHEMBL2861882

FC1CC(F)(F)C(F)(F)C(F)(F)C1(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8154258 0.97
SCHEMBL8146394 0.97
SCHEMBL8159545 0.97
SCHEMBL15410716 0.91
SCHEMBL26134391 0.91
SCHEMBL15409368 0.91
SCHEMBL8210079 0.87
SCHEMBL17176854 0.78
Tetrahydrofuran SCHEMBL2395494 0.76 ALDH1A1 (0.35)
SCHEMBL20220720 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12298083-B2 Temperature control unit and temperature control device TOMOEGAWA CORPORATION (JP) 2025-05-13 US disclosed
CN-118679554-A Etching method 株式会社力森诺科 2024-09-20 CN disclosed
US-11574821-B2 Substrate treating method, substrate treating liquid and substrate treating apparatus SCREEN Holdings Co., Ltd. 2023-02-07 US disclosed
CN-111116306-B Preparation method of hexafluorobenzene 洛阳森蓝化工材料科技有限公司 2022-09-13 CN disclosed
US-20220189762-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2022-06-16 US disclosed
US-11302525-B2 Substrate processing method and substrate processing apparatus SCREEN Holdings Co., Ltd. 2022-04-12 US disclosed
US-20220026162-A1 TEMPERATURE CONTROL UNIT AND TEMPERATURE CONTROL DEVICE TOMOEGAWA CORPORATION (JP) 2022-01-27 US disclosed
US-20210331192-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. 2021-10-28 US disclosed
US-11133175-B2 Substrate treating method and substrate treating apparatus SCREEN Holdings Co., Ltd. 2021-09-28 US disclosed
EP-3879219-A1 TEMPERATURE CONTROL UNIT AND TEMPERATURE CONTROL DEVICE Tomoegawa Co., Ltd. (JP) 2021-09-15 EP disclosed
US-6403846-B1 HYDROGENATING FLUOROCYCLOALKENES TO FLUOROCYCLOALKANES USING NOBLE METAL CATALYST; EXCELLENT STABILITY IN WATER; FOR USE AS DETERGENTS JAPAN AS REPRESENTED BY DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2002-06-11 US disclosed
US-6395700-B1 CATALYTIC HYDROGENATION NIPPON ZEON CO., LTD. (JP) 2002-05-28 US disclosed
US-6194619-B1 FOR CLEANING SOLID SURFACES E. I. DU PONT DE NEMOURS AND COMPANY 2001-02-27 US disclosed
EP-1056078-A1 Process for preparation of optical information recording disc, optical information recording disc and dye solution FUJI PHOTO FILM CO., LTD. (JP) 2000-11-29 EP disclosed
EP-1043297-A1 PROCESS FOR THE PREPARATION OF COMPOUNDS HAVING -CH2-CHF- GROUPS Nippon Zeon Co., Ltd. (JP) 2000-10-11 EP disclosed
EP-0994089-A1 FLUORINATED HYDROCARBONS, DETERGENTS, DETERGING METHOD, POLYMER-CONTAINING FLUIDS, AND METHOD OF FORMING POLYMER FILMS Nippon Zeon Co., Ltd. (JP) 2000-04-19 EP disclosed
EP-0982281-A1 FLUORINATED, SATURATED HYDROCARBONS JAPAN as Represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2000-03-01 EP disclosed
EP-0602133-A1 GEM-DIHYDROPOLYFLUOROALKANES AND MONOHYDROPOLYFLUOROALKENES, PROCESSES FOR THEIR PRODUCTION, AND USE OF GEM-DIHYDROPOLYFLUOROALKANES IN CLEANING COMPOSITIONS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1994-06-22 EP disclosed
US-5268122-A Azeotropic mixture E. I. DU PONT DE NEMOURS AND COMPANY (US) 1993-12-07 US disclosed
WO-1993005002-A2 GEM-DIHYDROPOLYFLUOROALKANES AND MONOHYDROPOLYFLUOROALKENES, PROCESSES FOR THEIR PRODUCTION, AND USE OF GEM-DIHYDROPOLYFLUOROALKANES IN CLEANING COMPOSITIONS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1993-03-18 WO disclosed