SCHEMBL2862279

SCHEMBL2862279

CCN(CC)CCCCCCCC/C=C\CCCCCCCC(=O)O

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 4/20 0.65
PPARD Q03181 4/20 0.65
PPARA Q07869 4/20 0.65
MAPT P10636 4/20 0.65
F7 P08709 4/20 0.65
F3 P13726 4/20 0.65
TERT O14746 3/20 0.65
PTPN1 P18031 3/20 0.65
BLM P54132 3/20 0.65
HSD17B10 Q99714 3/20 0.65
FABP4 P15090 2/20 0.65
LMNA P02545 2/20 0.65
ALOX15 P16050 2/20 0.65
RECQL P46063 2/20 0.65
DUSP3 P51452 2/20 0.65
CYP19A1 P11511 2/20 0.65
PTGS1 P23219 2/20 0.65
KMT2A Q03164 2/20 0.65
PTPN7 P35236 2/20 0.65
TDP1 Q9NUW8 2/20 0.65

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Oleic Acid SCHEMBL10943784 0.95 PPARG (0.74) PPARGPPARDPPARAMAPTF7
Oleic Acid SCHEMBL10943790 0.95 PPARG (0.74) PPARGPPARDPPARAMAPTF7
SCHEMBL11621162 0.89 GPR84 (0.56) PPARGPPARDPPARAPTPN1HSD17B10
SCHEMBL9152115 0.89 GPR84 (0.56) PPARGPPARDPPARAPTPN1HSD17B10
SCHEMBL1772090 0.89 GPR84 (0.56) PPARGPPARDPPARAPTPN1HSD17B10
SCHEMBL708830 0.89 GPR84 (0.56) PPARGPPARDPPARAPTPN1HSD17B10
SCHEMBL9148396 0.89 GPR84 (0.56) PPARGPPARDPPARAPTPN1HSD17B10
SCHEMBL710294 0.89 GPR84 (0.56) PPARGPPARDPPARAPTPN1HSD17B10
SCHEMBL9155100 0.89 GPR84 (0.56) PPARGPPARDPPARAPTPN1HSD17B10
Oleic Acid SCHEMBL14956553 0.88 PPARG (0.79) PPARGPPARDPPARAMAPTF7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7749599-B2 Cushioning material for a polishing pad NHK SPRING CO., LTD. (JP) 2010-07-06 US disclosed
US-20090011221-A1 Cushioning Material for a Polishing Pad TOYO QUALITY ONE CORPORATION (JP) 2009-01-08 US disclosed
EP-0044481-B2 PROCESS FOR THE PRODUCTION OF ELASTOMERIC MOULDED PRODUCTS Mobay Chemical Corporation (US) 1987-03-11 EP disclosed
US-4469653-A AS POLYMERIZATION CATALYSTS BASF AKTIENGESELLSCHAFT (DE) 1984-09-04 US disclosed
EP-0044481-B1 PROCESS FOR THE PRODUCTION OF ELASTOMERIC MOULDED PRODUCTS Mobay Chemical Corporation (US) 1984-06-13 EP disclosed
EP-0044481-A1 Process for the production of elastomeric moulded products Mobay Chemical Corporation (US) 1982-01-27 EP disclosed
US-4282329-A REACTING WITH POLYISOCYANATE TO FORM CELLULAR POLYURETHANE PLASTICS BAYER AKTIENGESELLSCHAFT (DE) 1981-08-04 US disclosed
US-4240950-A REACTING A SUSPENSION OF AN INORGANIC FILLER IN A POLYOL WITH A POLYISOCYANATE TO PRODUCE A POLYURETHANE BAYER AKTIENGESELLSCHAFT (DE) 1980-12-23 US disclosed