Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FABP4 | P15090 | 2/20 | 0.37 |
| ▸ | FABP3 | P05413 | 1/20 | 0.37 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | APEX1 | P27695 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | CA5A | P35218 | 1/20 | 0.33 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2869222 | 0.97 | FABP4 (0.38) | FABP4FABP3FABP5KDM4EPOLB | |
| Hydrochloric Acid SCHEMBL11010689 | 0.94 | FABP4 (0.36) | FABP4FABP3FABP5KDM4EPOLB | |
| SCHEMBL83879 | 0.94 | FABP4 (0.36) | FABP4FABP3FABP5KDM4EPOLB | |
| Ammonia Solution, Strong SCHEMBL9809148 | 0.94 | FABP4 (0.36) | FABP4FABP3FABP5KDM4EPOLB | |
| SCHEMBL28147772 | 0.90 | FABP4 (0.36) | FABP4FABP3FABP5KDM4EPOLB | |
| SCHEMBL11783087 | 0.88 | FABP4 (0.32) | FABP4FABP3FABP5KDM4EPOLB | |
| SCHEMBL27798197 | 0.86 | DAPK1 (0.32) | FABP4FABP3FABP5KDM4ETSHR | |
| SCHEMBL7121356 | 0.86 | FABP4 (0.37) | FABP4FABP3FABP5KDM4EPOLB | |
| SCHEMBL27843854 | 0.84 | FABP4 (0.32) | FABP4FABP3FABP5 | |
| SCHEMBL27942866 | 0.82 | FABP4 (0.32) | FABP4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103503121-B | Material for forming passivation film for semiconductor substrate, passivation film for semiconductor substrate and method for manufacturing same, and solar cell element and method for manufacturing same | 日立化成株式会社 | 2017-04-12 | — | — | CN | disclosed |
| US-9406834-B2 | Material for forming passivation film for semiconductor substrate, passivation film for semiconductor substrate and method of producing the same, and photovoltaic cell element and method of producing the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-20140242741-A1 | MATERIAL FOR FORMING PASSIVATION FILM FOR SEMICONDUCTOR SUBSTRATE, PASSIVATION FILM FOR SEMICONDUCTOR SUBSTRATE AND METHOD OF PRODUCING THE SAME, AND PHOTOVOLTAIC CELL ELEMENT AND METHOD OF PRODUCING THE SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-08-28 | — | — | US | disclosed |
| US-8748877-B2 | Material for forming passivation film for semiconductor substrate, passivation film for semiconductor substrate and method of producing the same, and photovoltaic cell element and method of producing the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-06-10 | — | — | US | disclosed |
| US-20120313199-A1 | MATERIAL FOR FORMING PASSIVATION FILM FOR SEMICONDUCTOR SUBSTRATE, PASSIVATION FILM FOR SEMICONDUCTOR SUBSTRATE AND METHOD OF PRODUCING THE SAME, AND PHOTOVOLTAIC CELL ELEMENT AND METHOD OF PRODUCING THE SAME | HITACHI CHEMICAL COMPANY, LTD. | 2012-12-13 | — | — | US | disclosed |
| US-7754844-B2 | Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2010-07-13 | — | — | US | disclosed |
| EP-1561768-B1 | POLYARYLENE ETHER COMPOUND CONTAINING SULFONIC ACID GROUP, COMPOSITION CONTAINING SAME, AND METHOD FOR MANUFACTURING THOSE | TOYO BOSEKI (JP) | 2009-09-30 | — | — | EP | disclosed |
| US-20080070086-A1 | Phase-Separated Polymer Electrolyte Membrane, Electrode - Phase-Separated Polymer Electrolyte Membrane Joint Using Same, Method for Manufacture Thereof, and Fuel Cell Using Same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2008-03-20 | — | — | US | disclosed |
| EP-1845573-A1 | PHASE SEPARATION TYPE POLYMER ELECTROLYTE FILM, ELECTRODE/PHASE SEPARATION TYPE POLYMER ELECTROLYTE FILM ASSEMBLY EMPLOYING THE SAME, PROCESSES FOR PRODUCING THE SAME, AND FUEL CELL EMPLOYING THE SAME | Hitachi Chemical Co., Ltd. (JP) | 2007-10-17 | — | — | EP | disclosed |
| CN-1292015-C | Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those | TOYO BOSEKI (JP) | 2006-12-27 | — | — | CN | disclosed |
| US-20060166048-A1 | Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2006-07-27 | — | — | US | disclosed |
| CN-1703443-A | Polyarylene ether compound containing sulfonic acid group, composition containing the same, and method for producing the same | TOYO BOSEKI (JP) | 2005-11-30 | — | — | CN | disclosed |
| EP-1561768-A1 | POLYARYLENE ETHER COMPOUND CONTAINING SULFONIC ACID GROUP, COMPOSITION CONTAINING SAME, AND METHOD FOR MANUFACTURING THOSE | Toyo Boseki Kabushiki Kaisha (JP) | 2005-08-10 | — | — | EP | disclosed |
| US-5596128-A | SULFONATION WITHOUT A CATALYST IN THE PRESENCE OF SOLVENT | KONISHI CHEMICAL IND. CO., LTD. (JP) | 1997-01-21 | — | — | US | disclosed |
| EP-0505582-B1 | SULFONATING AGENT AND PROCESS | KONISHI CHEM IND (JP) | 1996-07-31 | — | — | EP | disclosed |
| EP-0505582-A1 | SULFONATING AGENT AND PROCESS | KONISHI CHEMICAL IND. CO., LTD. (JP) | 1992-09-30 | — | — | EP | disclosed |