SCHEMBL28626643

SCHEMBL28626643

CCC(CC)C(CC)CCc1ccccc1O

nearest known ligand 0.49

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
HTR1A P08908 1/20 0.49
TAAR1 Q96RJ0 1/20 0.48
HSPA5 P11021 1/20 0.45
MPO P05164 4/20 0.43
TSHR P16473 3/20 0.42
CYP2D6 P10635 1/20 0.41
HIF1A Q16665 1/20 0.41
SLC6A4 P31645 1/20 0.41
HRH3 Q9Y5N1 1/20 0.41
AKR1B1 P15121 1/20 0.39
IAPP P10997 1/20 0.39
IDO1 P14902 1/20 0.38
CA12 O43570 1/20 0.38
CA2 P00918 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10610569 0.84 TSHR (0.49) HTR1ATAAR1HSPA5MPOTSHR
SCHEMBL14271047 0.81 HTR1A (0.49) HTR1ATAAR1HSPA5MPOTSHR
SCHEMBL9308109 0.81 HTR1A (0.49) HTR1ATAAR1HSPA5MPOTSHR
SCHEMBL14271048 0.81 HTR1A (0.49) HTR1ATAAR1HSPA5MPOTSHR
SCHEMBL11582743 0.81 HTR1A (0.49) HTR1ATAAR1HSPA5MPOTSHR
SCHEMBL18349 0.78 HTR1A (0.46) HTR1ATAAR1HSPA5MPOTSHR
SCHEMBL623900 0.78 TAAR1 (0.50) HTR1ATAAR1HSPA5MPOTSHR
SCHEMBL28922221 0.78 HTR1A (0.42) HTR1ATAAR1HSPA5TSHRCYP2D6
SCHEMBL6993443 0.78 HTR1A (0.46) HTR1ATAAR1HSPA5MPOTSHR
SCHEMBL678728 0.78 TAAR1 (0.54) HTR1ATAAR1HSPA5MPOTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120118458-A Curable composition, resin, and cured product 东京应化工业株式会社 2025-06-10 CN disclosed
CN-119937242-A Photosensitive resin composition 东京应化工业株式会社 2025-05-06 CN disclosed
CN-113337170-B Curable composition, cured product, near infrared absorbing filter, and method for producing same 东京应化工业株式会社 2024-04-05 CN disclosed
CN-117327362-A Curable resin composition 东京应化工业株式会社 2024-01-02 CN disclosed
CN-117215149-A Photosensitive resin composition 东京应化工业株式会社 2023-12-12 CN disclosed
CN-113337170-A Curable composition, cured product, near-infrared absorption filter, and method for producing same 东京应化工业株式会社 2021-09-03 CN disclosed