⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL689803 | 0.78 | — | — | |
| SCHEMBL23879680 | 0.71 | MAPT (0.36) | — | |
| SCHEMBL26185015 | 0.71 | MAPT (0.36) | — | |
| SCHEMBL9472831 | 0.71 | TDP1 (0.32) | — | |
| SCHEMBL12762458 | 0.71 | ESR1 (0.41) | — | |
| SCHEMBL5026666 | 0.70 | ESR1 (0.34) | — | |
| SCHEMBL21369184 | 0.70 | ESR1 (0.34) | — | |
| SCHEMBL952880 | 0.69 | MAPT (0.38) | — | |
| SCHEMBL124891 | 0.69 | MAPT (0.38) | — | |
| SCHEMBL20023890 | 0.68 | ESR1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109804310-B | Negative photosensitive resin composition, cured film, element and display device provided with cured film, and method for producing same | 东丽株式会社 | 2022-09-30 | — | — | CN | disclosed |
| CN-114460809-A | Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same | 东丽株式会社 | 2022-05-10 | — | — | CN | disclosed |
| CN-108885399-B | Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same | 东丽株式会社 | 2022-03-15 | — | — | CN | disclosed |
| CN-108604062-B | Negative photosensitive resin composition, cured film, display device having cured film, and method for producing same | 东丽株式会社 | 2021-11-09 | — | — | CN | disclosed |
| CN-108027561-B | Negative photosensitive resin composition, cured film, element and display device provided with cured film, and method for producing same | 东丽株式会社 | 2021-10-08 | — | — | CN | disclosed |