Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.92 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.71 |
| ▸ | TSHR | P16473 | 4/20 | 0.67 |
| ▸ | LMNA | P02545 | 3/20 | 0.67 |
| ▸ | MEN1 | O00255 | 3/20 | 0.67 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.67 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.67 |
| ▸ | THRB | P10828 | 2/20 | 0.43 |
| ▸ | DNM1 | Q05193 | 4/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Butyl Alcohol SCHEMBL7028948 | 1.00 | ALDH1A1 (0.92) | ALDH1A1SMN1; SMN2TSHRLMNAMEN1 | |
| Butyl Alcohol SCHEMBL1305605 | 1.00 | — | — | |
| Butyl Alcohol SCHEMBL29044530 | 1.00 | ALDH1A1 (0.92) | ALDH1A1SMN1; SMN2TSHRLMNAMEN1 | |
| Butyl Alcohol SCHEMBL1193596 | 1.00 | ALDH1A1 (0.92) | ALDH1A1SMN1; SMN2TSHRLMNAMEN1 | |
| Butyl Alcohol SCHEMBL18281525 | 1.00 | ALDH1A1 (0.92) | ALDH1A1SMN1; SMN2TSHRLMNAMEN1 | |
| Butyl Alcohol SCHEMBL10349177 | 0.96 | ALDH1A1 (0.85) | ALDH1A1SMN1; SMN2TSHRLMNAMEN1 | |
| Butyl Alcohol SCHEMBL8511786 | 0.96 | ALDH1A1 (0.85) | ALDH1A1SMN1; SMN2TSHRLMNAMEN1 | |
| Butyl Alcohol SCHEMBL10883422 | 0.96 | — | — | |
| Butyl Alcohol SCHEMBL10348859 | 0.96 | ALDH1A1 (0.85) | ALDH1A1SMN1; SMN2TSHRLMNAMEN1 | |
| Butyl Alcohol SCHEMBL29196222 | 0.96 | ALDH1A1 (0.85) | ALDH1A1SMN1; SMN2TSHRLMNAMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119045280-A | Negative photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 武汉柔显科技股份有限公司 | 2024-11-29 | — | — | CN | disclosed |
| CN-113820920-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2023-07-04 | — | — | CN | disclosed |
| CN-116113884-A | Method for producing cured product, method for producing laminate, and method for producing electronic device | 富士胶片株式会社 | 2023-05-12 | — | — | CN | disclosed |
| CN-115867866-A | Method for producing cured product, resin composition, developer, method for producing laminate, and method for producing semiconductor device | 富士胶片株式会社 | 2023-03-28 | — | — | CN | disclosed |
| CN-115755526-A | Photosensitive resin composition and method for producing cured relief pattern | 旭化成株式会社 | 2023-03-07 | — | — | CN | disclosed |
| CN-115729037-A | Cured product, laminate, semiconductor device, method for producing same, resin composition, and compound | 富士胶片株式会社 | 2023-03-03 | — | — | CN | disclosed |
| CN-115298040-A | Cylindrical printing plate and method for manufacturing printed matter | 东丽株式会社 | 2022-11-04 | — | — | CN | disclosed |
| CN-115185157-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2022-10-14 | — | — | CN | disclosed |
| CN-113820920-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-12-21 | — | — | CN | disclosed |
| CN-107850844-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-09-07 | — | — | CN | disclosed |