Ethylene

Ethylene

SCHEMBL2864475

C=C.CC(=O)OCCOCCOCCOC(C)=O

nearest known ligand 0.68

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.68
TSHR P16473 3/20 0.68
TP53 P04637 2/20 0.48
HIF1A Q16665 2/20 0.48
CHRM5 P08912 2/20 0.48
CHRM1 P11229 2/20 0.48
CHRM3 P20309 2/20 0.48
HSD17B10 Q99714 2/20 0.48
PGR P06401 1/20 0.48
CHRM2 P08172 1/20 0.48
CHRM4 P08173 1/20 0.48
HTR1A P08908 1/20 0.48
CHRNB2 P17787 1/20 0.48
TBXA2R P21731 1/20 0.48
CHRNB4 P30926 1/20 0.48
CHRNA3 P32297 1/20 0.48
CHRNA7 P36544 1/20 0.48
CHRNA4 P43681 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
CHRNA10 Q9GZZ6 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1121858 0.94 ALDH1A1 (0.75) ALDH1A1TSHRTP53HIF1ACHRM5
SCHEMBL8862661 0.94 ALDH1A1 (0.75) ALDH1A1TSHRTP53HIF1ACHRM5
SCHEMBL853024 0.94 ALDH1A1 (0.75) ALDH1A1TSHRTP53HIF1ACHRM5
SCHEMBL4394240 0.94 ALDH1A1 (0.75) ALDH1A1TSHRTP53HIF1ACHRM5
SCHEMBL8862742 0.94 ALDH1A1 (0.75) ALDH1A1TSHRTP53HIF1ACHRM5
Ethylene SCHEMBL11779173 0.91 ALDH1A1 (0.62) ALDH1A1TSHRCHRM5CHRM1CHRM3
Ethylene SCHEMBL3893318 0.91 ALDH1A1 (0.62) ALDH1A1TSHRCHRM5CHRM1CHRM3
Ethylene SCHEMBL8445487 0.91 ALDH1A1 (0.62) ALDH1A1TSHRCHRM5CHRM1CHRM3
Ethylene SCHEMBL966275 0.91 ALDH1A1 (0.62) ALDH1A1TSHRCHRM5CHRM1CHRM3
Ethylene SCHEMBL8438188 0.91 ALDH1A1 (0.86) ALDH1A1TSHRTP53HIF1ACHRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1574901-B1 METHOD FOR MANUFACTURING A PHOTORESIST COMPOSITION, USE OF A FILTERING DEVICE, COATING DEVICE TOKYO OHKA KOGYO CO LTD (JP) 2015-07-08 EP disclosed
US-7771911-B2 Process for producing photoresist composition, filter, coater and photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 2010-08-10 US disclosed
US-20060014098-A1 Process for producing photoresist composition, filter, coater and photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 2006-01-19 US disclosed
EP-1574901-A1 PROCESS FOR PRODUCING PHOTORESIST COMPOSITION, FILTER, COATER AND PHOTORESIST COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2005-09-14 EP disclosed