SCHEMBL28645009

SCHEMBL28645009

Nc1ccc2c(NS)cccc2c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PLAU P00749 1/20 0.53
▸ ALDH1A1 P00352 7/20 0.43
▸ HSD17B10 Q99714 5/20 0.43
▸ CYP3A4 P08684 4/20 0.43
▸ CASP1 P29466 3/20 0.42
▸ ALOX15 P16050 2/20 0.42
▸ CASP7 P55210 1/20 0.42
▸ HBB P68871 1/20 0.42
▸ HIF1A Q16665 1/20 0.42
▸ TDP1 Q9NUW8 1/20 0.42
▸ EGFR P00533 2/20 0.40
▸ CTDSP1 Q9GZU7 1/20 0.40
▸ KDM4E B2RXH2 3/20 0.36
▸ TSHR P16473 3/20 0.36
▸ MAPT P10636 2/20 0.36
▸ SMN1; SMN2 Q16637 2/20 0.36
▸ TP53 P04637 2/20 0.36
▸ ATM Q13315 2/20 0.36
▸ HSP90AA1 P07900 1/20 0.36
▸ HSP90AB1 P08238 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28432627 0.85 CTDSP1 (0.53) PLAUALDH1A1HSD17B10CYP3A4CASP1
SCHEMBL27769260 0.81 PLAU (0.53) PLAUALDH1A1HSD17B10CYP3A4CASP1
SCHEMBL2200054 0.74 ALDH1A1 (0.56) ALDH1A1HSD17B10CYP3A4ALOX15TDP1
SCHEMBL687458 0.74 PLAU (0.59) PLAUALDH1A1HSD17B10CYP3A4CASP1
SCHEMBL731002 0.73 PLAU (0.63) PLAUALDH1A1HSD17B10CYP3A4CASP1
SCHEMBL29404930 0.73 PLAU (0.63) PLAUALDH1A1HSD17B10CYP3A4CASP1
SCHEMBL29498391 0.73 PLAU (0.63) PLAUALDH1A1HSD17B10CYP3A4CASP1
SCHEMBL20130647 0.71 MAPT (0.56) PLAUALDH1A1HSD17B10TDP1EGFR
SCHEMBL7991130 0.69 PLAU (1.00) PLAUALDH1A1HSD17B10CYP3A4CASP1
SCHEMBL4663818 0.69 PLAU (0.59) PLAUALDH1A1HSD17B10CYP3A4CASP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110790928-B Polymer, photosensitive resin composition, pattern forming method, photosensitive dry film, and coating film for protecting electric and electronic parts 信越化学工业株式会社 2022-06-07 — — CN disclosed
CN-110016136-B Novel tetracarboxylic dianhydride, polyimide resin, method for producing same, photosensitive resin composition, and method for forming pattern 信越化学工业株式会社 2021-09-24 — — CN disclosed
CN-110790928-A Polymer, photosensitive resin composition, pattern forming method, photosensitive dry film, and coating film for protecting electric and electronic parts 信越化学工业株式会社 2020-02-14 — — CN disclosed
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