⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28654817 | 0.65 | — | — | |
| SCHEMBL2264839 | 0.65 | — | — | |
| SCHEMBL458834 | 0.65 | — | — | |
| Iodide SCHEMBL15550171 | 0.63 | — | — | |
| SCHEMBL28561075 | 0.61 | ALDH1A1 (0.35) | — | |
| SCHEMBL28847989 | 0.58 | ALDH1A1 (0.31) | — | |
| Ammonia Solution, Strong SCHEMBL28866252 | 0.56 | — | — | |
| SCHEMBL11233786 | 0.56 | — | — | |
| SCHEMBL11337866 | 0.56 | ALDH1A1 (0.36) | — | |
| SCHEMBL25369710 | 0.54 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116635794-A | Method for producing thick film resist pattern, thick film solution, and method for producing processed substrate | 默克专利有限公司 | 2023-08-22 | — | — | CN | disclosed |
| CN-109791376-B | Method for producing composition for coating resist pattern using solvent substitution method | 日产化学株式会社 | 2023-01-10 | — | — | CN | disclosed |
| CN-115244029-A | Process for preparing alkylated amines | 罗地亚经营管理公司 | 2022-10-25 | — | — | CN | disclosed |
| CN-114730144-A | Replacement liquid between resist patterns, and method for producing resist pattern using same | 默克专利有限公司 | 2022-07-08 | — | — | CN | disclosed |
| CN-107533302-B | Composition for coating resist pattern | 日产化学工业株式会社 | 2022-02-01 | — | — | CN | disclosed |
| CN-113785243-A | Composition for resist pattern metallization process | 日产化学株式会社 | 2021-12-10 | — | — | CN | disclosed |