SCHEMBL2866068

SCHEMBL2866068

O=C(c1ccc(Oc2ccccc2)cc1)c1ccc(Oc2ccc(C(=O)c3ccc(Oc4ccccc4)cc3)cc2)cc1

nearest known ligand 0.88

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
SRD5A2 P31213 7/20 0.88
PARP10 Q53GL7 1/20 0.69
POLB P06746 1/20 0.65
ELANE P08246 1/20 0.61
ALDH1A1 P00352 1/20 0.59
ERCC5 P28715 1/20 0.58
FEN1 P39748 1/20 0.58
LTA4H P09960 2/20 0.57
TSHR P16473 1/20 0.57
NR1H2 P55055 1/20 0.56
BAX Q07812 1/20 0.56
AKR1C3 P42330 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13599782 1.00 SRD5A2 (0.88) SRD5A2PARP10POLBELANEALDH1A1
SCHEMBL235530 1.00 SRD5A2 (0.88) SRD5A2PARP10POLBELANEALDH1A1
SCHEMBL9536469 1.00 SRD5A2 (0.88) SRD5A2PARP10POLBELANEALDH1A1
SCHEMBL1082112 1.00 SRD5A2 (0.88) SRD5A2PARP10POLBELANEALDH1A1
SCHEMBL26759067 0.98 SRD5A2 (0.84) SRD5A2PARP10POLBELANEALDH1A1
SCHEMBL22415445 0.98 SRD5A2 (0.84) SRD5A2PARP10POLBELANEALDH1A1
SCHEMBL234249 0.98 SRD5A2 (0.84) SRD5A2PARP10POLBELANEALDH1A1
SCHEMBL1069817 0.98 SRD5A2 (0.84) SRD5A2PARP10POLBELANEALDH1A1
Hydrochloric Acid SCHEMBL20788690 0.96 SRD5A2 (0.81) SRD5A2PARP10POLBELANEALDH1A1
SCHEMBL9419497 0.95 SRD5A2 (0.80) SRD5A2PARP10POLBELANEALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7754844-B2 Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those TOYO BOSEKI KABUSHIKI KAISHA (JP) 2010-07-13 US disclosed
EP-1561768-B1 POLYARYLENE ETHER COMPOUND CONTAINING SULFONIC ACID GROUP, COMPOSITION CONTAINING SAME, AND METHOD FOR MANUFACTURING THOSE TOYO BOSEKI (JP) 2009-09-30 EP disclosed
US-20060166048-A1 Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those TOYO BOSEKI KABUSHIKI KAISHA (JP) 2006-07-27 US disclosed
EP-1561768-A1 POLYARYLENE ETHER COMPOUND CONTAINING SULFONIC ACID GROUP, COMPOSITION CONTAINING SAME, AND METHOD FOR MANUFACTURING THOSE Toyo Boseki Kabushiki Kaisha (JP) 2005-08-10 EP disclosed