⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17828313 | 0.84 | — | — | |
| Hydroquinone SCHEMBL7867621 | 0.82 | ESR1 (0.34) | — | |
| SCHEMBL6895322 | 0.81 | — | — | |
| SCHEMBL14780720 | 0.80 | — | — | |
| SCHEMBL30981515 | 0.73 | — | — | |
| SCHEMBL16149960 | 0.73 | THRB (0.31) | — | |
| SCHEMBL1200557 | 0.71 | — | — | |
| SCHEMBL4905672 | 0.70 | — | — | |
| SCHEMBL5438053 | 0.69 | — | — | |
| SCHEMBL4913690 | 0.69 | HSD17B10 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 91 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250289960-A1 | MATERIAL KIT, CURABLE COMPOSITION, FILM FORMING METHOD, AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2025-09-18 | — | — | US | disclosed |
| US-20240416578-A1 | LAYER FORMING COMPOSITION, FILM FORMING METHOD, AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2024-12-19 | — | — | US | disclosed |
| US-10807401-B2 | Cylindrical printing plate, cylindrical printing plate precursor, method for manufacturing cylindrical printing plate precursor, and method for manufacturing cylindrical printing plate | FUJIFILM CORPORATION (JP) | 2020-10-20 | — | — | US | disclosed |
| EP-3412473-B1 | CYLINDRICAL PRINTING PLATE, CYLINDRICAL PRINTING MASTER PLATE, METHOD FOR MANUFACTURING CYLINDRICAL PRINTING MASTER PLATE, AND METHOD FOR MANUFACTURING CYLINDRICAL PRINTING PLATE | FUJIFILM CORP (JP) | 2020-02-19 | — | — | EP | disclosed |
| EP-3290220-B1 | FLEXOGRAPHIC PRINTING PLATE | FUJIFILM CORP (JP) | 2019-07-31 | — | — | EP | disclosed |
| EP-3260301-B1 | FLEXOGRAPHIC PRINTING PLATE | FUJIFILM CORP (JP) | 2018-12-19 | — | — | EP | disclosed |
| EP-3156249-B1 | FLEXOGRAPHIC PRINTING ORIGINAL PLATE FOR LASER ENGRAVING AND FLEXOGRAPHIC PRINTING PLATE | FUJIFILM CORP (JP) | 2018-12-12 | — | — | EP | disclosed |
| EP-3412473-A1 | CYLINDRICAL PRINTING PLATE, CYLINDRICAL PRINTING MASTER PLATE, METHOD FOR MANUFACTURING CYLINDRICAL PRINTING MASTER PLATE, AND METHOD FOR MANUFACTURING CYLINDRICAL PRINTING PLATE | FUJIFILM Corporation (JP) | 2018-12-12 | — | — | EP | disclosed |
| US-20180339536-A1 | CYLINDRICAL PRINTING PLATE, CYLINDRICAL PRINTING PLATE PRECURSOR, METHOD FOR MANUFACTURING CYLINDRICAL PRINTING PLATE PRECURSOR, AND METHOD FOR MANUFACTURING CYLINDRICAL PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2018-11-29 | — | — | US | disclosed |
| US-10059138-B2 | Flexo printing plate | FUJIFILM CORPORATION (JP) | 2018-08-28 | — | — | US | disclosed |
| US-20110059302-A1 | CURABLE COMPOSITION FOR IMPRINT, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2011-03-10 | — | — | US | disclosed |
| EP-2244281-A1 | CURABLE COMPOSITION FOR NANOIMPRINT AND PATTERN-FORMING METHOD | FUJIFILM Corporation (JP) | 2010-10-27 | — | — | EP | disclosed |
| WO-2010104188-A1 | CURABLE COMPOSITION FOR IMPRINT,PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-09-16 | — | — | WO | disclosed |
| US-20100121013-A1 | CURABLE COMPOSITION FOR PHOTOIMPRINT, ITS CURED PRODUCT AND PRODUCTION METHOD FOR IT, AND COMPONENT OF LIQUID-CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2010-05-13 | — | — | US | disclosed |
| WO-2010050614-A1 | COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2010-05-06 | — | — | WO | disclosed |
| US-20100009138-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20100009287-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20100009137-A1 | COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20090283937-A1 | CURABLE COMPOSITION FOR NANOIMPRINT, AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2009-11-19 | — | — | US | disclosed |
| US-20090011367-A1 | INTERFACE BINDER, RESIST COMPOSITION CONTAINING THE SAME, LAMINATE FOR FORMING MAGNETIC RECORDING MEDIUM HAVING LAYER CONTAINING THE SAME, MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM USING THE SAME, AND MAGNETIC RECORDING MEDIUM PRODUCED BY THE MANUFACTURING METHOD | FUJIFILM CORPORATION (JP) | 2009-01-08 | — | — | US | disclosed |