SCHEMBL2867416

SCHEMBL2867416

CC=CC(=O)OCC(O)COP(=O)(O)O

nearest known ligand 0.50

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
LPAR1 Q92633 11/20 0.50
LPAR5 Q9H1C0 4/20 0.50
LPAR4 Q99677 3/20 0.50
LPAR2 Q9HBW0 3/20 0.50
LPAR3 Q9UBY5 3/20 0.50
ENPP2 Q13822 3/20 0.50
LPAR6 P43657 2/20 0.50
CES2 O00748 1/20 0.47
TRPV1 Q8NER1 1/20 0.47
PGK1 P00558 1/20 0.42
PGK2 P07205 1/20 0.42
PGD P52209 2/20 0.40
MPI P34949 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20335453 0.86 TSHR (0.39)
SCHEMBL20477149 0.84 LPAR1 (0.38) LPAR1LPAR5LPAR4LPAR2LPAR3
SCHEMBL5535259 0.80 TSHR (0.35)
SCHEMBL347488 0.80 TSHR (0.35)
Phosphoric Acid SCHEMBL8763242 0.80 MAPT (0.35) LPAR1LPAR5LPAR4LPAR2LPAR3
SCHEMBL9174558 0.79 LPAR1 (0.49) LPAR1LPAR5LPAR4LPAR2LPAR3
SCHEMBL11108878 0.79 ATM (0.35)
SCHEMBL18744459 0.78 LPAR1 (0.58) LPAR1LPAR5LPAR4LPAR2LPAR3
SCHEMBL9656433 0.77 TSHR (0.55)
SCHEMBL144845 0.77 HCAR2 (0.36) LPAR5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230216055-A1 BINDER COMPOSITION FOR SECONDARY BATTERY GRST SINGAPORE PTE. LTD. (SG) 2023-07-06 US disclosed
US-20230178740-A1 BINDER COMPOSITION FOR SECONDARY BATTERY GRST SINGAPORE PTE. LTD. (SG) 2023-06-08 US disclosed
US-7723283-B2 Water-soluble amphoteric copolymer, production method thereof, and application thereof NIPPON SHOKUBAI CO., LTD. (JP) 2010-05-25 US disclosed
CN-100564411-C (methyl) acrylic acid polymer and unsaturated alkylene glycol copolymer and production method thereof NIPPON CATALYTIC CHEM IND (JP) 2009-12-02 CN disclosed
US-20090198029-A1 N-VINYL CYCLIC LACTAM POLYMER, PRODUCTION METHOD THEREOF, AND APPLICATION THEREOF NIPPON SHOKUBAI CO., LTD (JP) 2009-08-06 US disclosed
CN-101171273-A Water-soluble polymer, production method thereof, and application thereof NIPPON CATALYTIC CHEM IND (JP) 2008-04-30 CN disclosed
US-7285611-B2 (Meth)acrylic acid type polymer and unsaturated polyalkylene glycol type copolymer, and methods for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2007-10-23 US disclosed
US-20070021313-A1 Water-soluble amphoteric copolymer, production method thereof, and application thereof NIPPON SHOKUBAI CO., LTD. (JP) 2007-01-25 US disclosed
CN-1896111-A (meth) acrylic acid type polymer and unsaturated polyalkylene glycol type copolymer, and methods for production thereof NIPPON CATALYTIC CHEM IND (JP) 2007-01-17 CN disclosed
CN-1891727-A Water-soluble amphoteric copolymer, production method thereof, and application thereof NIPPON CATALYTIC CHEM IND (JP) 2007-01-10 CN disclosed
US-20070004885-A1 (Meth) acrylic acid type polymer and unsaturated polyalkylene glycol type copolymer, and methods for production thereof YONEDA ATSURO 2007-01-04 US disclosed
CN-1284807-C Water-soluble copolymer NIPPON CATALYTIC CHEM IND (JP) 2006-11-15 CN disclosed
US-7132487-B2 (Meth) acrylic acid type polymer and unsaturated polyalkylene glycol type copolymer, and methods for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2006-11-07 US disclosed
CN-1269857-C (meth) acrylic acid type polymer and unsaturated polyalkylene glycol type copolymer, and production method therefor NIPPON CATALYTIC CHEM IND (JP) 2006-08-16 CN disclosed
US-6998453-B2 (Meth)acrylic acid type polymer and unsaturated polyalkylene glycol type copolymer, and methods for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2006-02-14 US disclosed
US-20060004162-A1 (Meth) acrylic acid type polymer and unsaturated polyalkylene glycol type copolymer, and methods for production thereof YONEDA ATSURO 2006-01-05 US disclosed
CN-1590418-A Water-soluble copolymer NIPPON CATALYTIC CHEM IND (JP) 2005-03-09 CN disclosed
US-20030158361-A1 (Meth) acrylic acid type polymer and unsaturated polyalkylene glycol type copolymer, and methods for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2003-08-21 US disclosed
CN-1417240-A (meth) acrylic acid type polymer and unsaturated polyalkylene glycol type copolymer, and production method therefor NIPPON CATALYTIC CHEM IND (JP) 2003-05-14 CN disclosed
EP-1300426-A1 (Meth)acrylic acid type polymer and unsaturated polyalkylene glycol type copolymer, and methods for production thereof Nippon Shokubai Co., Ltd. (JP) 2003-04-09 EP disclosed