SCHEMBL2867501

SCHEMBL2867501

CCCCC[N+](CCC)(CCC)CCCCC

nearest known ligand 0.87

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
SLC22A1 O15245 4/20 0.86
SLC22A2 O15244 1/20 0.86
ALDH1A1 P00352 1/20 0.75
TP53 P04637 1/20 0.75
CYP3A4 P08684 1/20 0.75
ALOX15 P16050 1/20 0.75
TSHR P16473 1/20 0.75
ALOX12 P18054 1/20 0.75
SMN1; SMN2 Q16637 1/20 0.75
HIF1A Q16665 1/20 0.75
HSD17B10 Q99714 1/20 0.75
DNM1 Q05193 7/20 0.67

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2867004 1.00 SLC22A1 (0.86) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
SCHEMBL5294970 1.00 SLC22A1 (0.86) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
Bromide SCHEMBL5087865 0.97 ALDH1A1 (0.81) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
Iodide SCHEMBL5088109 0.97 SLC22A1 (0.80) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
Iodide SCHEMBL5087111 0.97 SLC22A1 (0.80) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
SCHEMBL5304214 0.97 SLC22A1 (0.87) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
SCHEMBL2871694 0.97 SLC22A1 (0.87) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
SCHEMBL5299409 0.97 SLC22A1 (0.87) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
SCHEMBL5294484 0.97 SLC22A1 (0.87) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
SCHEMBL4374169 0.97 SLC22A1 (0.87) SLC22A1SLC22A2ALDH1A1TP53CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12252632-B2 Chemical-mechanical polishing composition, rinse composition, chemical- mechanical polishing method, and rinsing method ENTEGRIS, INC. (US) 2025-03-18 US claimed
US-20220372329-A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMICAL-MECHANICAL POLISHING METHOD, AND RINSING METHOD ENTEGRIS, INC. 2022-11-24 US claimed
EP-2863452-A1 Battery separation layer comprising a quaternary ammonium fluorinated salt coating material Samsung SDI Co., Ltd. (KR) 2015-04-22 EP claimed
US-12252632-B2 Chemical-mechanical polishing composition, rinse composition, chemical- mechanical polishing method, and rinsing method ENTEGRIS, INC. (US) 2025-03-18 US disclosed
CN-111849369-B Surface protective film and optical member 日东电工株式会社 2024-04-26 CN disclosed
CN-113382860-B Adhesive sheet and use thereof 日东电工株式会社 2024-03-22 CN disclosed
US-20220372329-A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMICAL-MECHANICAL POLISHING METHOD, AND RINSING METHOD ENTEGRIS, INC. 2022-11-24 US disclosed
CN-113382860-A Adhesive sheet and use thereof 日东电工株式会社 2021-09-10 CN disclosed
CN-111849369-A Surface protection film and optical member 日东电工株式会社 2020-10-30 CN disclosed
WO-2020162231-A1 ADHESIVE SHEET AND USE THEREOF 日東電工株式会社 2020-08-13 WO disclosed
EP-2863452-A1 Battery separation layer comprising a quaternary ammonium fluorinated salt coating material Samsung SDI Co., Ltd. (KR) 2015-04-22 EP disclosed
EP-2657277-A1 Surface protection film NITTO DENKO CORPORATION (JP) 2013-10-30 EP disclosed
US-20130280527-A1 SURFACE PROTECTION FILM NITTO DENKO CORPORATION (JP) 2013-10-24 US disclosed
US-20120202055-A1 PRESSURE-SENSITIVE ADHESIVE SHEET AND SURFACE PROTECTIVE FILM NITTO DENKO CORPORATION (JP) 2012-08-09 US disclosed
EP-2484734-A2 Pressure-sensitive adhesive sheet and surface protective film Nitto Denko Corporation (JP) 2012-08-08 EP disclosed
US-7799853-B2 Adhesive composition, adhesive sheet, and surface protective film NITTO DENKO CORPORATION (JP) 2010-09-21 US disclosed
US-20090163626-A1 ADHESIVE COMPOSITION, ADHESIVE SHEET, AND SURFACE PROTECTIVE FILM NITTO DENKO CORPORATION (JP) 2009-06-25 US disclosed