SCHEMBL28679045

SCHEMBL28679045

O=C(Oc1cccc2c1ccc1c3ccccc3ccc21)c1ccccc1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 8/20 0.67
▸ ESR1 P03372 5/20 0.67
▸ ESR2 Q92731 5/20 0.67
▸ HSD17B10 Q99714 4/20 0.67
▸ MAPT P10636 4/20 0.67
▸ MEN1 O00255 4/20 0.67
▸ GAA P10253 3/20 0.67
▸ SMN1; SMN2 Q16637 2/20 0.67
▸ JAK2 O60674 1/20 0.67
▸ USP2 O75604 1/20 0.67
▸ ALOX15 P16050 1/20 0.67
▸ NPSR1 Q6W5P4 1/20 0.67
▸ PARP1 P09874 1/20 0.58
▸ ALOX5 P09917 2/20 0.55
▸ TDP1 Q9NUW8 1/20 0.54
▸ LMNA P02545 1/20 0.54
▸ METAP2 P50579 1/20 0.54
▸ METAP1 P53582 1/20 0.54
▸ HDAC6 Q9UBN7 1/20 0.54
▸ PTGES O14684 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30874080 0.90 KMT2A (0.70) KMT2AESR1ESR2HSD17B10MAPT
SCHEMBL2477732 0.90 KMT2A (0.70) KMT2AESR1ESR2HSD17B10MAPT
SCHEMBL28679043 0.88 ESR1 (0.68) KMT2AESR1ESR2HSD17B10MAPT
SCHEMBL28683211 0.86 KMT2A (0.69) KMT2AESR1ESR2HSD17B10MAPT
SCHEMBL29265470 0.85 KMT2A (0.62) KMT2AESR1ESR2HSD17B10MAPT
Benzoic Acid SCHEMBL23122871 0.85 KMT2A (0.64) KMT2AESR1ESR2HSD17B10MAPT
SCHEMBL27807134 0.85 HSD17B10 (0.51) KMT2AESR1ESR2HSD17B10MAPT
SCHEMBL1043660 0.84 ALOX5 (0.63) KMT2AESR1ESR2HSD17B10MAPT
SCHEMBL29370959 0.84 KMT2A (0.69) KMT2AESR1ESR2HSD17B10MAPT
Phenol SCHEMBL28288930 0.84 KMT2A (0.67) KMT2AESR1ESR2HSD17B10MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 — — CN disclosed
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