⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27710308 | 0.88 | — | — | |
| SCHEMBL703555 | 0.88 | — | — | |
| SCHEMBL703773 | 0.88 | — | — | |
| SCHEMBL28186391 | 0.84 | — | — | |
| SCHEMBL5834350 | 0.84 | — | — | |
| SCHEMBL705087 | 0.83 | — | — | |
| SCHEMBL15643167 | 0.81 | — | — | |
| SCHEMBL27932577 | 0.80 | — | — | |
| SCHEMBL1070213 | 0.80 | — | — | |
| SCHEMBL28256604 | 0.80 | LMNA (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6040101-A | Carrier particles for use in electrostatic image development and electrostatic image developer | NIPPON SHOKUBAI CO., LTD. (JP) | 2000-03-21 | — | — | US | claimed |
| US-20140295109-A1 | FILM WITH TRANSPARENT ELECTROCONDUCTIVE MEMBRANE AND ITS USE | DAINIPPON PRINTING CO LTD (JP) | 2014-10-02 | — | — | US | disclosed |
| US-20140113230-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM | ROHM & HAAS ELECT MAT (KR) | 2014-04-24 | — | — | US | disclosed |
| CN-103261972-A | Two-component developer | CANON KK | 2013-08-21 | — | — | CN | disclosed |
| CN-101646718-B | Curable resin composition, protective film, and method for forming protective film | JSR CORP JP | 2013-04-03 | — | — | CN | disclosed |
| US-7812530-B2 | Flexible substrate and organic device using the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-10-12 | — | — | US | disclosed |
| CN-101646718-A | The formation method of curable resin composition, protective membrane and protective membrane | JSR CORP JP | 2010-02-10 | — | — | CN | disclosed |
| US-20090291293-A1 | FILM WITH TRANSPARENT ELECTROCONDUCTIVE MEMBRANE AND ITS USE | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-11-26 | — | — | US | disclosed |
| CN-101324755-A | Radiation sensitive resin composition, interlayer dielectric and microlens, and method for producing thereof | JSR CORP (JP) | 2008-12-17 | — | — | CN | disclosed |
| CN-101226329-A | Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof | JSR CORP (JP) | 2008-07-23 | — | — | CN | disclosed |
| US-7378157-B2 | Gas barrier film, and display substrate and display using the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-05-27 | — | — | US | disclosed |
| US-20060093758-A1 | Gas barrier film, and display substrate and display using the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2006-05-04 | — | — | US | disclosed |
| US-20050236985-A1 | Flexible substrate and organic device using the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2005-10-27 | — | — | US | disclosed |
| EP-0798054-B1 | Process for producing a coated film continuously | NIPPON CATALYTIC CHEM IND (JP) | 2003-09-03 | — | — | EP | disclosed |
| EP-1325948-A1 | Process for producing a coated film continuously | NIPPON SHOKUBAI CO., LTD. (JP) | 2003-07-09 | — | — | EP | disclosed |
| EP-0671450-B1 | USE OF A SURFACE TREATMENT COMPOSITION FOR COATINGS REDUCING THE PERMEABILITY FOR GASES | NIPPON CATALYTIC CHEM IND (JP) | 2002-08-21 | — | — | EP | disclosed |
| US-6040101-A | Carrier particles for use in electrostatic image development and electrostatic image developer | NIPPON SHOKUBAI CO., LTD. (JP) | 2000-03-21 | — | — | US | disclosed |
| US-5728770-A | COMPRISING A SILANE, ORGANOMETALLIC COMPOUMD, A COMPOUND WITH TWO FUNCTIONAL GROUPS AND A SOLVENT; EXCELLENT GAS BARRIER PROPERTIES | NIPPON SHOKUBAI CO., LTD. (JP) | 1998-03-17 | — | — | US | disclosed |
| EP-0798054-A2 | Process for producing a coated film continuously | NIPPON SHOKUBAI CO., LTD. (JP) | 1997-10-01 | — | — | EP | disclosed |
| EP-0671450-A1 | SURFACE TREATMENT COMPOSITION AND SURFACE-TREATED RESIN MOLDING | NIPPON SHOKUBAI CO., LTD. (JP) | 1995-09-13 | — | — | EP | disclosed |