SCHEMBL2871124

SCHEMBL2871124

C=CS(=O)(=O)OC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5574805 0.83
SCHEMBL5574396 0.79
SCHEMBL15221749 0.77
SCHEMBL28379836 0.75 ALDH1A1 (0.35)
SCHEMBL8886203 0.74 TSHR (0.33)
SCHEMBL5573420 0.74
SCHEMBL5571035 0.72
SCHEMBL14515705 0.72
SCHEMBL16004475 0.69
SCHEMBL297922 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11708459-B2 Vinyl sulfonyl agents for thiol-ene polymerization and related uses Inkbit, LLC (US) 2023-07-25 US disclosed
US-20230132021-A1 VINYL SULFONYL AGENTS FOR THIOL-ENE POLYMERIZATION AND RELATED USES Inkbit, LLC 2023-04-27 US disclosed
US-20100215979-A1 Method of forming metal film and metal wiring pattern, undercoat composition for forming metal film and metal wiring pattern, and metal film Nawafune, Hidemi (JP) 2010-08-26 US disclosed
CN-101194042-A Method for forming metal film and metal wiring pattern, foundation composition for formation of metal film and metal wiring pattern, and metal film OMRON TATEISI ELECTRONICS CO (JP) 2008-06-04 CN disclosed