SCHEMBL28714

SCHEMBL28714

Cc1cc(C)cc(O)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11574035 1.00 ALDH1A1 (1.00) —
Hydrochloric Acid SCHEMBL7075578 0.96 ALDH1A1 (0.93) —
SCHEMBL28868049 0.96 ALDH1A1 (0.93) —
SCHEMBL3808139 0.96 ALDH1A1 (0.93) —
Hydrochloric Acid SCHEMBL27463860 0.96 ALDH1A1 (0.93) —
SCHEMBL30017927 0.96 ALDH1A1 (0.93) —
Hydrogen Sulfide SCHEMBL27992697 0.96 ALDH1A1 (0.93) —
Bromide SCHEMBL11047598 0.93 ALDH1A1 (0.87) —
Hydrochloric Acid SCHEMBL6039947 0.93 ALDH1A1 (0.87) —
Bromide SCHEMBL11047596 0.93 ALDH1A1 (0.87) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 15057 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117466277-B Hard carbon precursor, hard carbon, preparation method of hard carbon and sodium battery 湖南中科星城石墨有限公司 2026-05-15 — — CN claimed
EP-4702010-A1 PHOTOACTIVE COMPOUNDS Merck Patent GmbH (DE) 2026-03-04 — — EP claimed
US-20260044080-A1 COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION, RESIN CURED FILM, AND IMAGE DISPLAY ELEMENT RESONAC CORPORATION (JP) 2026-02-12 — — US claimed
WO-2025025631-A1 FALLING FILM CRYSTALLIZATION METHOD, FALLING FILM CRYSTALLIZER AND TEMPERATURE CONTROL METHOD 上海东庚化工技术有限公司 2025-02-06 — — WO claimed
EP-4499638-A1 PYRIDO-[3,4-D]PYRIDAZINE AMINE DERIVATIVES USEFUL AS NLRP3 DERIVATIVES Ventus Therapeutics U.S., Inc. (US) 2025-02-05 — — EP claimed
CN-222335130-U Xylenol tower to intermittent column feed line structure 枣庄振兴新材料科技有限公司 2025-01-10 — — CN claimed
WO-2024223739-A1 PHOTOACTIVE COMPOUNDS MERCK PATENT GMBH (DE) 2024-10-31 — — WO claimed
US-12110390-B2 Solid dispersion, preparation method therefor, chain-extended polyurethane using same, and epoxy resin composition comprising same SAMYANG CORPORATION (KR) 2024-10-08 — — US claimed
CN-118295211-A Positive photosensitive resin composition, method for forming pattern by photoresist, and printed circuit board 深圳市容大感光科技股份有限公司 2024-07-05 — — CN claimed
WO-2024134926-A1 COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION, RESIN CURED FILM, AND IMAGE DISPLAY ELEMENT 株式会社レゾナック 2024-06-27 — — WO claimed
US-4167540-A BUTADIENE-STYRENE COPOLYMER HOECHST AKTIENGESELLSCHAFT (DE) 1979-09-11 — — US claimed
US-4163826-A NYLON COPOLYAMIDE ENAMEL SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1979-08-07 — — US claimed
US-4086282-A FROM ISOPHORONE, HALOGEN OR HALOGEN COMPOUND AS CATALYST SHELL OIL COMPANY (US) 1978-04-25 — — US claimed
US-4069220-A SOLVENTS JIM WALTER RESOURCES, INC. (US) 1978-01-17 — — US claimed
US-4028284-A Phenolic chelate resin UNITIKA LTD. (JA) 1977-06-07 — — US claimed
US-4024195-A CATALYST, ALCOHOL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JA) 1977-05-17 — — US claimed
US-3987068-A COPPER-NITRILE COMPLEX CATALYST E. I. DU PONT DE NEMOURS AND COMPANY (US) 1976-10-19 — — US claimed
US-3979412-A Process for producing 3-anilino-5-pyrazolones FUJI PHOTO FILM CO., LTD. (JA) 1976-09-07 — — US claimed
US-3947603-A PHENOLS FIRMENICH & CIE (CH) 1976-03-30 — — US claimed
US-3936399-A Process of producing phenolic chelate resin using iminodiacetic acid UNITIKA LTD. (JA) 1976-02-03 — — US claimed
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