SCHEMBL28714

SCHEMBL28714

Cc1cc(C)cc(O)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11574035 1.00 ALDH1A1 (1.00)
SCHEMBL3808139 0.96 ALDH1A1 (0.93)
SCHEMBL28868049 0.96 ALDH1A1 (0.93)
SCHEMBL30017927 0.96 ALDH1A1 (0.93)
Hydrochloric Acid SCHEMBL27463860 0.96 ALDH1A1 (0.93)
Hydrochloric Acid SCHEMBL7075578 0.96 ALDH1A1 (0.93)
Hydrogen Sulfide SCHEMBL27992697 0.96 ALDH1A1 (0.93)
Hydrochloric Acid SCHEMBL6039947 0.93 ALDH1A1 (0.87)
Bromide SCHEMBL11047596 0.93 ALDH1A1 (0.87)
Bromide SCHEMBL11047598 0.93 ALDH1A1 (0.87)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 15057 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117466277-B Hard carbon precursor, hard carbon, preparation method of hard carbon and sodium battery 湖南中科星城石墨有限公司 2026-05-15 CN claimed
EP-4702010-A1 PHOTOACTIVE COMPOUNDS Merck Patent GmbH (DE) 2026-03-04 EP claimed
US-20260044080-A1 COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION, RESIN CURED FILM, AND IMAGE DISPLAY ELEMENT RESONAC CORPORATION (JP) 2026-02-12 US claimed
WO-2025025631-A1 FALLING FILM CRYSTALLIZATION METHOD, FALLING FILM CRYSTALLIZER AND TEMPERATURE CONTROL METHOD 上海东庚化工技术有限公司 2025-02-06 WO claimed
EP-4499638-A1 PYRIDO-[3,4-D]PYRIDAZINE AMINE DERIVATIVES USEFUL AS NLRP3 DERIVATIVES Ventus Therapeutics U.S., Inc. (US) 2025-02-05 EP claimed
CN-222335130-U Xylenol tower to intermittent column feed line structure 枣庄振兴新材料科技有限公司 2025-01-10 CN claimed
WO-2024223739-A1 PHOTOACTIVE COMPOUNDS MERCK PATENT GMBH (DE) 2024-10-31 WO claimed
US-12110390-B2 Solid dispersion, preparation method therefor, chain-extended polyurethane using same, and epoxy resin composition comprising same SAMYANG CORPORATION (KR) 2024-10-08 US claimed
CN-118295211-A Positive photosensitive resin composition, method for forming pattern by photoresist, and printed circuit board 深圳市容大感光科技股份有限公司 2024-07-05 CN claimed
WO-2024134926-A1 COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION, RESIN CURED FILM, AND IMAGE DISPLAY ELEMENT 株式会社レゾナック 2024-06-27 WO claimed
US-4167540-A BUTADIENE-STYRENE COPOLYMER HOECHST AKTIENGESELLSCHAFT (DE) 1979-09-11 US claimed
US-4163826-A NYLON COPOLYAMIDE ENAMEL SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1979-08-07 US claimed
US-4086282-A FROM ISOPHORONE, HALOGEN OR HALOGEN COMPOUND AS CATALYST SHELL OIL COMPANY (US) 1978-04-25 US claimed
US-4069220-A SOLVENTS JIM WALTER RESOURCES, INC. (US) 1978-01-17 US claimed
US-4028284-A Phenolic chelate resin UNITIKA LTD. (JA) 1977-06-07 US claimed
US-4024195-A CATALYST, ALCOHOL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JA) 1977-05-17 US claimed
US-3987068-A COPPER-NITRILE COMPLEX CATALYST E. I. DU PONT DE NEMOURS AND COMPANY (US) 1976-10-19 US claimed
US-3979412-A Process for producing 3-anilino-5-pyrazolones FUJI PHOTO FILM CO., LTD. (JA) 1976-09-07 US claimed
US-3947603-A PHENOLS FIRMENICH & CIE (CH) 1976-03-30 US claimed
US-3936399-A Process of producing phenolic chelate resin using iminodiacetic acid UNITIKA LTD. (JA) 1976-02-03 US claimed