SCHEMBL28734516

SCHEMBL28734516

NC(=S)NC1(Cc2ccccc2)C=CC=CC1

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.35
GAA P10253 4/20 0.35
KMT2A Q03164 2/20 0.35
LMNA P02545 1/20 0.35
HTT P42858 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
MAOA P21397 2/20 0.34
MAOB P27338 2/20 0.34
CTSL P07711 2/20 0.33
TP53 P04637 1/20 0.32
TYR P14679 1/20 0.32
TSHR P16473 1/20 0.32
TAS2R38 P59533 1/20 0.32
HSD17B10 Q99714 1/20 0.32
ALOX12 P18054 2/20 0.31
HPGD P15428 1/20 0.31
MEN1 O00255 1/20 0.30
POLB P06746 1/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9462490 0.80 MAOA (0.39) ALDH1A1LMNASMN1; SMN2MAOAMAOB
Hydrochloric Acid SCHEMBL10383764 0.79 MAOA (0.38) ALDH1A1LMNASMN1; SMN2MAOAMAOB
SCHEMBL29700255 0.76 MAOA (0.34) ALDH1A1KMT2AMAOAMAOBALOX12
SCHEMBL29212732 0.76 TAAR1 (0.42) ALDH1A1GAAKMT2ALMNATSHR
SCHEMBL28080470 0.75
SCHEMBL28090100 0.75
SCHEMBL28123746 0.75
SCHEMBL29046194 0.71 CTSC (0.46) TSHR
SCHEMBL29060724 0.69 MAOA (0.33) ALDH1A1MAOAMAOBALOX12HPGD
SCHEMBL17414858 0.68 MAOA (0.47) LMNAHTTMAOAMAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115667404-A Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2023-01-31 CN disclosed
CN-115190891-A Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2022-10-14 CN disclosed
CN-114341731-A Method for producing cured film, photocurable resin composition, method for producing laminate, and method for producing semiconductor device 富士胶片株式会社 2022-04-12 CN disclosed