SCHEMBL28759147

SCHEMBL28759147

CCO[Si](OCC)(C1=CCCCCC1)C1=CCCCCC1

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.31
RAB9A P51151 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL107667 0.98 ALDH1A1 (0.32) ALDH1A1RAB9A
SCHEMBL5420817 0.92
SCHEMBL28469084 0.85 ALDH1A1 (0.31) ALDH1A1RAB9A
SCHEMBL3344099 0.85 ALDH1A1 (0.31) ALDH1A1RAB9A
SCHEMBL3344103 0.85 ALDH1A1 (0.31) ALDH1A1RAB9A
SCHEMBL5316273 0.85 ALDH1A1 (0.31) ALDH1A1RAB9A
SCHEMBL28469378 0.85 ALDH1A1 (0.31) ALDH1A1RAB9A
SCHEMBL28478691 0.85 ALDH1A1 (0.31) ALDH1A1RAB9A
SCHEMBL5005188 0.83 MEN1 (0.31)
SCHEMBL106988 0.83 ALDH1A1 (0.30) ALDH1A1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114594657-A Composition for forming silicon-containing resist underlayer film and pattern formation method 信越化学工业株式会社 2022-06-07 CN disclosed