Sulfuric Acid

Sulfuric Acid

SCHEMBL28778945

COCCOCCOCCOC.O=S(=O)([O-])[O-].O=S(=O)([O-])[O-].[Ti+4]

nearest known ligand 0.48

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Known targets — ChEMBL curated mechanism

dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CA2 P00918 3/20 0.48
TSHR P16473 2/20 0.33
USP2 O75604 1/20 0.33
KDM4E B2RXH2 1/20 0.32
NPC1 O15118 1/20 0.32
ALDH1A1 P00352 1/20 0.32
LMNA P02545 1/20 0.32
MAPT P10636 1/20 0.32
HPGD P15428 1/20 0.32
RAB9A P51151 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
AOC2 O75106 1/20 0.31
CA1 P00915 1/20 0.31
CA5A P35218 1/20 0.31
CA7 P43166 1/20 0.31
CA9 Q16790 1/20 0.31
CA5B Q9Y2D0 1/20 0.31
CYP3A4 P08684 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9158995 0.80 RECQL (0.47) CA2TSHRHPGD
SCHEMBL19306496 0.80 CA2 (0.42) CA2TSHRKDM4EALDH1A1LMNA
SCHEMBL30129647 0.80 CA2 (0.42) CA2TSHRKDM4EALDH1A1LMNA
Sulfuric Acid SCHEMBL8643620 0.80 CA2 (0.50) CA2TSHRUSP2ALDH1A1AOC2
Trifluoromethanesulfonic Acid SCHEMBL28531970 0.79 CA2 (0.41) CA2AOC2
Hydrochloric Acid SCHEMBL9319274 0.78 CA2 (0.41) CA2TSHRKDM4ECYP3A4
Fluoride Ion SCHEMBL8940251 0.78 CA2 (0.41) CA2TSHRKDM4ECYP3A4
SCHEMBL23647292 0.78 CA2 (0.44) CA2TSHRKDM4ECYP3A4
SCHEMBL4607864 0.78 CA2 (0.44) CA2TSHRKDM4ECYP3A4
SCHEMBL398 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-217306474-U Object stage and system for measuring epitaxial layer thickness of epitaxial wafer 上海优睿谱半导体设备有限公司 2022-08-26 CN claimed
CN-114739300-A Method for measuring epitaxial layer thickness of epitaxial wafer 上海优睿谱半导体设备有限公司 2022-07-12 CN claimed
CN-114739300-A Method for measuring epitaxial layer thickness of epitaxial wafer 上海优睿谱半导体设备有限公司 2022-07-12 CN disclosed