SCHEMBL2880136

SCHEMBL2880136

C=C(C)C(=O)OCOC(=O)c1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
STS P08842 11/20 0.39
POLB P06746 1/20 0.36
APEX1 P27695 1/20 0.36
HTT P42858 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
ELANE P08246 1/20 0.34
CA12 O43570 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
CA9 Q16790 1/20 0.34
PPARG P37231 1/20 0.33
RAB9A P51151 1/20 0.32
TP53 P04637 1/20 0.32
HPGD P15428 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
HDAC3 O15379 1/20 0.31
HDAC4 P56524 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC7 Q8WUI4 1/20 0.31
HDAC2 Q92769 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2742200 0.91 STS (0.43) STSPOLBAPEX1HTTTDP1
SCHEMBL2742214 0.88 POLB (0.49) STSPOLBAPEX1HTTTDP1
SCHEMBL15450680 0.86 STS (0.36) STSPOLBAPEX1HTTTDP1
SCHEMBL18499593 0.85 STS (0.34) STSPOLBAPEX1HTTTDP1
SCHEMBL2742190 0.82 ELANE (0.44) STSPOLBELANECA1CA2
SCHEMBL10233233 0.81 ELANE (0.34) STSELANECA12CA1CA2
SCHEMBL9963665 0.79 STS (0.43) STSPOLBAPEX1HTTTDP1
SCHEMBL18499650 0.78 POLB (0.35) POLBAPEX1HTTTDP1CA12
SCHEMBL10204305 0.78 HDAC3 (0.39) STSAPEX1TDP1HDAC3HDAC4
SCHEMBL9966140 0.78 STS (0.55) STSTDP1CA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120034559-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH FUJIFILM CORPORATION (JP) 2012-02-09 US disclosed
US-20120003583-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed